Used AMAT / APPLIED MATERIALS Centura II eMax #9224033 for sale

AMAT / APPLIED MATERIALS Centura II eMax is a high-quality industry-standard reactor designed for cutting-edge semiconductor manufacturing. It features advanced dual-chamber technology that allows for simple and efficient wafer processing. AMAT Centura II eMax is a maximum efficiency professional grade reactor that offers scalability to meet a variety of process requirements. The flexible modular design allows for customization to meet the specific needs of each customer. The reactor has an integrated control equipment that allows for fully automated control depending on the user's needs. The reactor has a unique lower chamber design that allows for high process throughput and efficient resource utilization. This lower chamber is the most efficient in the industry and features a variety of adjustable adjustable temperature, pressure and flow control settings. The reactor also features an energy control system to minimize power consumption and maximize process uniformity. It features a state-of-the-art high-temperature alloy deposition unit that provides uniform film deposition on wafers with dimensions up to 6 inches or more. This advanced deposition machine is coupled with a high-temperature annealing tool for fast and precise thermal treatment of the deposited films. APPLIED MATERIALS Centura II eMax is also designed with an integrated gas delivery asset which helps maintain uniform flow rates while providing the highest level of repeatability for multi-cycle runs. This model also monitors and adjusts the gas composition when necessary to allow for fine control over all of the process parameters. Centura II eMax is an advanced, high-efficiency reactor that provides exceptional performance that exceeds industry standards. It offers significant improvements in process uniformity and throughput rates while also ensuring power conservation and efficiency. This state-of-the-art reactor has the versatility to accommodate a wide range of wafer sizes and process requirements.