Used AMAT / APPLIED MATERIALS Centura II eMax #9247556 for sale

AMAT / APPLIED MATERIALS Centura II eMax
ID: 9247556
System (3) Chambers.
AMAT / APPLIED MATERIALS Centura II eMax reactor is a next-generation deposition tool for small-scale production of thin-film structures. It is designed for semiconductor device fabrication and material analysis. The tool features a state-of-the-art process chamber with high temperature and pressure capabilities. It is capable of high-level deposition process performance with precision and accuracy up to 20 nm. AMAT Centura II eMax is equipped with an automated single-wafer and dual-wafer (complete wafer ArF) loading equipment. The component wafers mount quickly onto a high-performance pedal bed. The wafer bed rotates and locks against a magnetically driven edge flange before being transferred to the deposition chamber. It features advanced susceptor suspensions for improved thermal performance and stability, as well as advanced deposition techniques such as electron cyclotron resonance. APPLIED MATERIALS Centura II eMax also features a wide range of process control systems. This includes an integrated system for controlling pressure and temperature, and active plasma monitoring with a built-in mass spectrometer. The unit includes a multi-ground tracing monitoring machine for the deposition chamber walls to ensure uniform deposition across the wafer. Centura II eMax reactor includes a variety of safety features. It is equipped with multiple safety shutoff sensors, automatic pressure and temperature alarms, and integrated grounding systems. It also features a fully automated wafer cleaning process to ensure consistent device performance. AMAT / APPLIED MATERIALS Centura II eMax is a reliable, cost-effective deposition tool for small-scale production. It is ideal for semiconductor device manufacturing, semiconductor materials research, and thin-film deposition of complex structures. The tool is delivered with high performance and accuracy for process optimization, and a wide variety of process control options for precision deposition.
There are no reviews yet