Used AMAT / APPLIED MATERIALS Centura II eMax #9260047 for sale

AMAT / APPLIED MATERIALS Centura II eMax reactor is a high-temperature, high-pressure process chamber used in semiconductor manufacturing. The full equipment consists of an integrated heat exchanger and pressure control system, high purity gas delivery, ultra-high vacuum (UHV) environment, and a suite of in-situ metrology tools. AMAT Centura II eMax reactor is designed for superior process control and repeatability, enabling the reliable fabrication of leading-edge, multi-layer semiconductor devices. At the heart of APPLIED MATERIALS Centura II eMax is a higher temperature, higher pressure process chamber. This chamber is capable of temperatures up to 900°C and contains pressure at up to one atmosphere. Owing to its efficient design and sophisticated power/electrical configuration, Centura II eMax can rapidly heat up or cool down, enabling efficient cycle-times. Additionally, the process chamber is self-monitoring and provides a real-time view of process temperature and pressure. AMAT / APPLIED MATERIALS Centura II eMax also features an advanced integrated heat exchanger and pressure control unit. This integrated machine intelligently regulates the temperature and pressure of the process chamber depending on the unique lithography process. This tool ensures that the process chamber is accurately regulated, regardless of the semiconductor layer being manufactured. The integrated asset also enables cost savings as extra external components are not required. AMAT Centura II eMax includes high-purity gas delivery for CVD (chemical vapor deposition) and other processes. They include source gases, as well as exhaust / purification systems are available. This allows the user to create a wide range of material chemistries for different semiconductor needs. APPLIED MATERIALS Centura II eMax contains an ultra-high vacuum (UHV) environment to provide maximum process purity. This UHV environment ensures that volatile particles, contaminants, or gases do not damage the performance or quality of the semiconductor wafers. Additionally, the UHV environment can also aid in contamination reduction, as certain particles and gases can be easily removed from the chamber. In terms of in-situ metrology, Centura II eMax provides top of the line capabilities. This includes the ability to monitor material deposition rate and profile of the wafer, as well as monitor device performance during processing. Additionally, AMAT / APPLIED MATERIALS Centura II eMax also provides the ability to measure film thickness of different materials, automatically tune the chamber conditions using advanced recipe control, and visualize the different layers being created. AMAT Centura II eMax model is a top of the line reactor designed for advanced semiconductor fabrication. Its powerful and advanced features allow for accurate and repeatable processing of high-performance semiconductor wafers. This is achieved with the advanced process chamber, integrated heat exchanger/pressure control equipment, high-purity gas delivery, ultra-high vacuum environment, and suite of in-situ metrology tools.