Used AMAT / APPLIED MATERIALS Centura II #184086 for sale

AMAT / APPLIED MATERIALS Centura II reactor is a state-of-the-art tool for etching and cleaning various materials such as metals, glass, and semiconductors. This robust and reliable reactor offers a high degree of flexibility in terms of substrate size, etch depth, and selectivity. This enables it to be used for a wide range of process steps needed to create products in the high-tech industry, such as semiconductor fabrication, photomasks, and MEMS. AMAT Centura II is designed to handle batch and single wafer processing, so it is suitable for both single wafer and batch applications. It operates using an inductively coupled plasma (ICP) technology to generate etch plasma. This allows for superior uniformity and selectivity over other etch processes available. The ICP source has adjustable power level, pressure regulation, and pulse options that enable the etching process to be tuned for specific applications. APPLIED MATERIALS CENTURA-II reactor also comes with an automated load-lock equipment, enabling substrate loading and unloading without breaking vacuum. This enables high throughput and efficient operation. Additionally, the reactor features an automated gas delivery system and RF generator in order to ensure a precise environment during the etching process. This reactor comes equipped with a sophisticated process control unit that allows users to adjust gas flows, power levels, chamber pressure, and other process variables. This machine also allows users to monitor, record, and analyze etch process results over time. This helps to ensure consistent and high-quality product results. APPLIED MATERIALS Centura II reactor is an ideal solution for challenging etch processes, as it is both reliable and efficient. Its unique combination of robust process control and consistently accurate results, make it an indispensable tool for the high-tech industry.