Used AMAT / APPLIED MATERIALS Centura II #9130163 for sale

AMAT / APPLIED MATERIALS Centura II reactor is a tool used for processing semiconductor wafers. This reactor is an advanced high-throughput, cost-efficient plasma-etching and deposition equipment capable of supporting production of a wide variety of technologies. With state-of-the-art automation, AMAT Centura II reactor has the capability to process high-volume production and process a variety of tasks with high quality, repeatability and reliability. The machine consists of a central process chamber, connected to a load-lock chamber and plasma source. APPLIED MATERIALS CENTURA-II reactor utilizes radio frequency (RF) plasma technology and can be used for etching and depositing both organic and inorganic materials. The chamber temperature and pressure can be precisely controlled and the internal pressure can range from 10 mTorr to 10 Torr, while the temperature can range from 4˚C to 50˚C. The tool utilizes a number of integrated process sources which are capable of controlling the process gas flows, pressure, RF power and magnetic field configurations. CENTURA-II reactor is equipped with a Gridless Internal Electrode (GIE) system which consists of two concentric triangular electrodes and two concentric rings. The rings provide uniform electric fields for improved wafer uniformity and faster process speeds.This unit also reduces the maintenance cost because there is no need for grid replacement. Centura II reactor has a Sub-Atmospheric Process (SAP) machine, which allows faster etching speeds, low single-wafer electrical duty cycles, low gas flows and minimal contamination. AMAT / APPLIED MATERIALS CENTURA-II reactor provides high-precision performance, with a delivery accuracy accuracy of +/- 0.005 inch, producing high-quality process results with low particle counts, uniformity and improved wafer yield. The reactor is also available with a suite of advanced monitoring and automation software, which allows the users to customize the set-up with their specific requirements. The superior performance and flexibility of APPLIED MATERIALS Centura II reactor make it the ideal etching and deposition tool for production and process in the semiconductor industry. It is well suited for doing cost-effective and complex processing tasks, with precision and repeatability.