Used AMAT / APPLIED MATERIALS Centura II #9153815 for sale

AMAT / APPLIED MATERIALS Centura II reactor is a deposition equipment built to provide a range of applications for complex structures. It is constructed to deposit layers onto substrates with extreme precision and accuracy at low temperatures. This allows the formation of very thin, uniform layers on any substrate that is exposed to the system. AMAT Centura II is a plasma-enhanced chemical vapor deposition (PECVD) unit that offers both substrate heating and cooling, as well as deposition rate control. The machine is capable of operating at low temperatures and pressures, thereby minimizing oxidation and contamination. Additionally, the deposition process can produce multiple layers simultaneously, allowing for a higher resolution and greater precision. The buffer layers produced are critical for advanced interconnects and high current applications. APPLIED MATERIALS CENTURA-II has multiple configurations, including a single-wafer and batch-mode process hardware, as well as a multi-station capability. This grants users flexibility in terms of process scale and throughput. The tool is equipped with multiple gas-handling capabilities and the high frequency power supplies are designed for operation at a wide range of frequencies for both etching and deposition. AMAT / APPLIED MATERIALS CENTURA-II has a number of features that enable advanced process capabilities. These include adjustable process controls, substrate holders for both wafer and substrate production, as well as high resolution temperature control. The asset has a comprehensive set of diagnostics and actuation features that enable easy calibration and validation of process parameters. In terms of safety, APPLIED MATERIALS Centura II is constructed with a hermetically sealed chamber. This provides protection against harmful airborne particles, while also making the model maintenance-free. In conclusion, CENTURA-II reactor is a feature-rich equipment that provides reliable, precise and accurate deposition of layers onto any substrate. Its many innovative features make it an excellent tool for a variety of application needs, while also providing a safe and secure working environment.