Used AMAT / APPLIED MATERIALS Centura MCVD #293595636 for sale

AMAT / APPLIED MATERIALS Centura MCVD is a chemical vapor deposition (CVD) reactor designed for the production of heavily doped, epitaxial films used for integrated circuit fabrication. It is composed of control unit, power supply, deposition chamber and a wafer-handling process. The control unit manages operational parameters such as deposition time, temperature, pressure, and reactant gases. It contains a small microprocessor with an operator interface and PLC programming. The control unit also includes measurement devices, valves and a data storage system to monitor the operations in the reactor. The power supply provides the electrical power necessary to operate the various components in the reactor. It is designed to supply alternating current with adjustable voltage and frequency to maintain a constant temperature in the deposition chamber. The deposition chamber is a pressure- and inert atmosphere-controlled environment that enables controlled chemical reactions to take place. It is enclosed to prevent the reactant gases from escaping and it also protect the reactants from atmosphere changes. The wafer-handling process is used to prepare the wafers that will be placed in the deposition chamber. It includes an arm that moves the wafer into the chamber and out of it. The arm has a positioning system and the necessary accurate temperature control to ensure the uniformity of the deposition. AMAT Centura MCVD reactor has a wide range of features that make it suitable for carrying out various processes in the microelectronic industry. It also has a long service life. Its reliability, flexibility, and ease-of-use make it a preferred choice for professionals in the microelectronics industry.