Used AMAT / APPLIED MATERIALS Centura MCVD #9383682 for sale

AMAT / APPLIED MATERIALS Centura MCVD is a type of chemical vapor deposition (CVD) reactor that is capable of producing a variety of single crystal materials. CVD is a process used to uniformly deposit thin films of chemical compounds (usually semiconductors) onto a substrate. The process uses a combination of gases and heat to produce a thin layer of material on the substrate surface. AMAT Centura MCVD is a high-performance reactor. It is equipped with a gas manifold, two susceptor elevators, and a vacuum pump. The gas manifold provides a source of reactive and carrier gases that are delivered to the reaction chamber. The two susceptor elevators are used to lower and raise the susceptor (a substrate holder) and substrate into and out of the reaction chamber. The vacuum pump is used to evacuate the chamber of any unwanted vapors and particles. The reactors can be used with multiple deposition sources, allowing for a variety of process procedures. This reactor is specifically designed for use with the CVD technique, which offers great control over deposition rates and properties. Depending on the type of material being deposited, this reactor can deposit at a rate of up to 7.5 microns per hour. Additionally, by controlling the flow rate of the gases and the temperature of the susceptor, the reaction conditions can be adjusted to optimize the crystalline structure of the material. The chamber of APPLIED MATERIALS Centura MCVD reactor is equipped with a quartz tube to ensure even gas distribution around the substrate as well as a quartz window which allows for visual process monitoring. The tube and window also come with an automated shutter for safety and to prevent damage from environmental contaminants. The reactor is designed with a number of safety features, such as a locking system for the door to prevent accidental entry and an automatic shut-off feature in case of an emergency. Additionally, it is equipped with a gas handling system to avoid hazardous material build-up, both in the chamber and outside. Centura MCVD reactor is a versatile, high-performance instrument for the chemical vapor deposition process. With its robust system design, it offers reliable and efficient processing of a variety of materials, enabling manufacturers to produce high-quality single crystal components.