Used AMAT / APPLIED MATERIALS Centura MxP+ #201320 for sale

AMAT / APPLIED MATERIALS Centura MxP+ reactor is an advanced plasma process reactor used to produce high-performance coatings, films and thin films. The MxP+ equipment combines a universal power supply, a silicon nitride substrate and a turret-type low-pressure island mask. AMAT Centura MxP+ reactor includes a controllable universal power supply that delivers up to 300 W of power. This enables its users to control the plasma flow rate and the temperature of the substrate to reduce the deposition risk. The power supply is designed to support low flow voltage and a variety of process gases, such as argon, oxygen, nitrogen, and helium, to optimize the process. The system also includes a robust control unit to monitor each process parameter in real-time. The MxP+ reactor has a heavy duty silicon nitride substrate holder machine that provides excellent uniformity across the wafer, even at low bondline pressures. The silicon nitride substrate holder has a low-pressure island mask turret, designed to ensure that the substrate is held secure without any surface damage. This turret tool is user friendly, easy to use, and provides a large window of processing flexibility. The MxP+ reactor also features a high purity quartz showerhead chamber. This chamber has a low-pressure environment that helps maintain a uniform, stable process for a wide range of film etching and deposition applications. The reactor also has a cooling asset and chamber gas distribution model to ensure uniformity of temperature and process control. The MxP+ reactor is a reliable and versatile plasma process tool that is used for many different applications, such as thin composition films, compound semiconductor films, multi-layer films, and surface-activated high-aspect-ratio stack. With its flexible power supply, uniform substrate holder, and advanced process control systems, the MxP+ is an ideal choice for advanced film production.