Used AMAT / APPLIED MATERIALS Centura MxP #293762513 for sale

AMAT / APPLIED MATERIALS Centura MxP is an advanced reactor designed for the deposition of dielectrics, passivation, and barrier layers in a variety of advanced packaging, semiconductor and device fabrication applications. AMAT Centura MxP is a specialized, high-temperature, single-chamber reactor that can perform multiple steps in a single process without the need for multiple chamber transfers. The innovative design of APPLIED MATERIALS Centura MxP offers a wide range of process capabilities, including the deposition of low-k dielectric materials, passivation layers, and barrier layers. The reactor features a unique multi-zone operating regime, allowing for independent temperature and pressure control in each zone, which allows higher deposition rates, efficient conformal coating, and high-quality topography in complex structures. The design of Centura MxP allows for a high degree of process control, due to the modular design of the reactor chamber and its independently controlled zones. The separate chamber for pulsed reactants enables optimal control of the process pressure inside the chamber. The reactor is also capable of accommodating rapid thermal processes, allowing for rapid thermal treatment of substrates at temperatures up to 850°C with a wide variety of gas and gas mixtures. This rapid thermal capability enables rapid deposition and annealing of dielectrics and barrier layers, allowing for shorter process times and improved yields. In addition, AMAT / APPLIED MATERIALS Centura MxP also features a state-of-the-art exhaust system with highly filtered purge gas to ensure clean, ultra-low particle deposition. The integrated remote monitoring and control capabilities of AMAT Centura MxP allow for easy integration into process control systems and automation platforms. APPLIED MATERIALS Centura MxP is also a stand-alone process platform, allowing users to load, monitor and control their processes without the need for additional external systems. Additionally, the reactor is highly configurable with a range of reactor chamber sizes and options available, enabling the user to tailor the system to their specific needs. Overall, Centura MxP is an advanced single-chamber reactor designed for applications requiring higher deposition rate, ultra-low particle deposition, and faster process times. The reactor features multi-zone controls, rapid thermal processes, clean exhaust, and easy integration into control systems, while its modular design allows for maximum process control and flexibility.