Used AMAT / APPLIED MATERIALS Centura MxP+ #9116736 for sale

AMAT / APPLIED MATERIALS Centura MxP+ reactor is a high throughput, single wafer reactor designed for producing advanced micro-devices. The MxP+ equipment is a versatile process platform that enables the user to develop and utilize a wide range of processes. The MxP+ features a large flat-bed reactor chamber, producing a uniform temperature and plasma distribution across the substrate surface. The MxP+ reactor contains two process modules, which can be used independently or in combination. The first module is the Standard Process Module (SPM), which allows for the deposition of thin films using well-characterized deposition techniques, such as low-pressure chemical vapor deposition (LPCVD). The second module is the Advanced Process Module (APM) which provides expanded functionality for more advanced process capabilities. The APM can be used for plasma-enhanced chemical vapor deposition (PECVD) and atomic layer deposition (ALD). The MxP+ reactor is capable of operating with a variety of gases and reactive materials, including silane, oxygen, and ammonia. The system is fully compatible with both processes and the process results can be transferred between the two modules. This allows users to customize their processes, while maintaining high quality results. The MxP+ provides an extensive range of safety features, including an inerting unit, a gas venting machine, an oxidation prevention tool and a temperature monitoring asset. These features combine to provide a safe operating environment and prevent any damage or contamination of the substrate. The MxP+ is also designed with sophisticated monitoring and control technology. This technology enables a wide range of process parameters to be monitored and adjusted dynamically, allowing for precise control of deposition rates, deposition uniformity and chamber temperatures. AMAT Centura MxP+ is ideal for processes requiring high throughput and high quality results. It is the ideal choice for a wide range of fields, from semiconductors to memory chips and from LEDs to solar cells. It is capable of depositing through a wide range of thicknesses and can be used to create nano-scale devices with clear reproducibility, ensuring consistently high quality results.