Used AMAT / APPLIED MATERIALS Centura MxP+ #9148385 for sale

AMAT / APPLIED MATERIALS Centura MxP+ is a high-performance parallel-plate susceptor reactor designed for high-volume manufacturing of compound semiconductor wafers. The reactor features an upper reaction chamber made of quartz and a lower reaction chamber constructed from stainless steel for maximum temperature uniformity and excellent process reproducibility. The maximum substrate size allowed is up to 8 inch. The MxP+ reactor is capable of operating in temperatures up to 1000°C. It features an advanced heating equipment that minimizes thermal gradients on the wafer during process runs. The upper heating element is composed of sintered, high-stability, low-radiation tungsten rods. The lower heating element is similarly constructed from high-stability tungsten rods and is equipped with a PLC-controlled reactive gas injector which gives precise control over gas flow and composition. The unique patented design of the MxP+ reactor ensures excellent temperature uniformity across the substrate and uniform reaction rate over the entire surface. The MxP+ reactor is equipped with a precision substrate transport system that minimizes thermal changes, increases throughput, and maintains a consistent wafer quality. The transport unit consists of a robot arm that is programmed to move substrates at a constant speed across the reaction chambers, while the automatic injection machine allows the injection of reactive gas into precise positions across the substrate to improve deposition uniformity. The MxP+ reactor is designed with an advanced physical vapor deposition (PVD) tool that provides re-deposition of up to 5 layers simultaneously, reducing the number of process steps required. The deposition controller is equipped with auto-tune capability to further improve process uniformity and accuracy, and is compatible with a variety of process recipes. The asset is also capable of CMP (chemical mechanical polishing) for planarization of deposited layers. The MxP+ reactor is specifically designed for high-volume semiconductor manufacturing applications, providing reliable and repeatable processes that result in high yields. The features of this highly advanced reactor are essential to meet the demands of today's high-volume production environment and ensure product quality and uniformity.