Used AMAT / APPLIED MATERIALS Centura MxP #9189048 for sale

AMAT / APPLIED MATERIALS Centura MxP Reactor is a platform for thin film growth that is designed to affordably produce high-quality, advanced materials for today's most demanding technology markets. AMAT Centura MxP Reactor uses high-energy plasma to etch, grow, and process a wide variety of materials including silicon, SiOx, SiNx, Ge, SiGe, and C. The reactor is designed to accommodate up to three deposition chambers and offers customizable configurations that are not only highly flexible, but also cost-effective. APPLIED MATERIALS Centura MxP Reactor offers a choice of magnetron sputtering sources and electron cyclotron resonance (ECR) sources for highly-efficient, low-cost thin film formation. The integrated wafer-handling robot allows for efficient wafer and substrate mounting and adjustment within the process chambers. The MxP is factory pre-configured for the user's specific requirements, including the choice of materials and plasma processing techniques. Centura MxP is designed with a number of features that maximize process efficiency and reduce operational costs. The reactor is equipped with real-time process monitoring, dual thermal bias capability, and aggressive power control. By using real-time process monitoring (RTP), the reactor can immediately recognize any dynamic changes in the deposition process and automatically adjust the process recipe to keep the process stable. Additionally, Dual Thermal Bias (DTN) allows electric bias to be applied to both the plasma and the substrate, promoting uniform deposition over large area targets and producing high-quality films. AMAT / APPLIED MATERIALS Centura MxP Reactor comes standard with ready-to-run recipes, detailed process monitoring, secure communication, and advanced plasma diagnostics for maximum processing performance. The reactor offers a maximum wafer size of 300mm, a maximum wafer temperature of up to 1000°C, and is capable of producing a large range of film thickness values from 10.0 to 1000.0 nm. AMAT Centura MxP Reactor is an excellent choice for many thin film deposition applications, providing users with a cost-effective and highly-configurable platform for the development of high-performance materials. With its reliable performance, excellent process control, and advanced features, APPLIED MATERIALS Centura MxP provides users with the best solutions for their most demanding process requirements.