Used AMAT / APPLIED MATERIALS Centura MxP #9262650 for sale

AMAT / APPLIED MATERIALS Centura MxP Reactor is a state-of-the-art PECVD (plasma-enhanced chemical vapour deposition) tool used for the deposition of thin films. It is designed to provide superior uniformity of coverage across a variety of substrate shapes and sizes. The MxP reactor consists of a vacuum chamber, an electrode assembly and a RF power supply. The vacuum chamber is designed to be leak-tight, allowing for the deposition of high-quality thin films with minimal contamination. The chamber has a high-temperature-resistant (HTR) lining to prevent damage to the interior. The electrode assembly includes two planar electrodes with adjustable voltage and current settings, allowing for the fine-tuning of the processing parameters. The RF power supply includes an adjustable frequency, enabling high deposition rates. The MxP Reactor is both flexible and reliable, making it well-suited for a variety of high-precision thin-film deposition tasks. The MxP Reactor is capable of depositing a wide range of materials, including but not limited to silicon, polysilicon, silicon nitride, and gallium arsenide. The thermal performance of the reactor is also excellent, with precise temperature control capabilities providing uniform deposition rates across substrates of various shapes and sizes. The MxP Reactor also features good plasma etch selectivity, allowing for the uniform removal of different materials from the substrate without any damage to the overall structure. The plasma etch selectivity of the MxP Reator is further enhanced thanks to its easy-to-use chamber cleaning equipment and two-channel gas sublimation system. The robust design of the MxP Reactor also stands out, with an interior chamber constructed from stainless steel and an outer casing made of aluminum alloy. This makes for a lightweight and sturdy unit, capable of operating for long durations with minimal maintenance. The MxP Reactor also features a convenient display screen, which provides clear and easy-to-read information regarding the temperature, pressures and process conditions in the chamber. The convenient monitoring unit enables operators to keep track of the overall performance in real-time, giving them the confidence to perform high-precision thin-film deposition tasks. In conclusion, AMAT Centura MxP Reactor is a reliable and versatile PECVD machine that is well-suited for the deposition of thin films across a variety of substrates. It features excellent thermal performance and plasma etch selectivity, as well as a robust design for long-term operation without needing excessive maintenance. The convenient display screen allows operators to monitor the overall performance in real-time, offering total control over the deposition process.