Used AMAT / APPLIED MATERIALS Centura MxP #9290475 for sale

AMAT / APPLIED MATERIALS Centura MxP is an advanced flexible-zone plasma enhanced chemical vapor deposition (PECVD) reactor designed for the processing and production of semiconductor devices. AMAT Centura MxP reactor is capable of processing up to six wafers simultaneously, and provides a reliable, cost-effective platform for the production of thin films and multi-layer stacks. APPLIED MATERIALS Centura MxP features advanced plasma control, precise temperature homogeneity, and on-the-fly process optimization to ensure superior film uniformity and quality. The reactor is capable of producing a variety of materials, including SiO2, Si3N4, SiN, Ta2O5, TaN, and Al2O3. The reactor is equipped with two independent plasma sources, enabling the formation of multi-layer stacks and multiple decoupling processes for films with complex materials compositions. Centura MxP uses multiple geometries to ensure precise temperature homogeneity across the entire wafer surface. The reactor's high aspect ratio enables uniform etching and deposition over the entire wafer surface. This enables uniform etching and deposition of high-aspect ratio features, such as trenches and combination structures. The reactor also features advanced temperature control, with adjustable gas flow, and a temperature-based auto calibration sequence for precision and repeatability. It is also equipped with a vacuum leak detection system for increased safety and reliability. AMAT / APPLIED MATERIALS Centura MxP offers the highest process reliability, process performance, and cost-efficiency for precise thin film deposition and etching. It is well-suited for the fabrication of MEMS, advanced interconnects, and several other challenging micro-fabrication applications. The reactor's state-of-the-art design allows for a short learning curve and fast incorporation into any production facility.