Used AMAT / APPLIED MATERIALS Centura MxP+ #9293856 for sale

AMAT / APPLIED MATERIALS Centura MxP+
ID: 9293856
Dry etcher Parallel plate type: RIE.
AMAT / APPLIED MATERIALS Centura MxP+ Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor is a production-scale advanced deposition equipment designed to enable high-rate, low-temperature deposition of ultra-thin films. This system is specifically designed for the production of high-performance optoelectronic components and other applications requiring rapid deposition at low temperatures. The PECVD unit consists of a reactor chamber, an independent plasma source, and a range of controllers for controlling the process recipe. Inside the chamber, the plasma is produced by applying a high-frequency power supply to a pair of ceramic electrodes, creating a high-temperature and high-pressure environment. This environment is then used to generate chemical reactants, which chemically and thermally interact with one another, forming a thin film on the exposed surface of the substrate. AMAT Centura MxP+ has an advanced cooling machine, allowing for rapid cooling of the process chamber and substrate. With the cooling tool, temperatures can be maintained and adjusted to meet the specific requirements of each deposition process. Additionally, the asset features a range of controllers for controlling various aspects of the deposition process, such as operating pressure, power levels, and film temperature. The combination of these features enables the model to achieve deposition rates of up to 200 nm per minute. In terms of process capabilities, APPLIED MATERIALS Centura MxP+ can deposit both metal and metal oxide films, as well as organic and dielectric materials, at temperatures as low as 50°C. This enables the production of high-performance optoelectronic components without the need for high temperatures, making the equipment ideal for applications including the production of ultra-thin films for solar cells, OLED displays, and other applications. Centura MxP+ also features an integrated planar magnetron source for generating nitrogen, helium, and other plasma species for applications requiring high-rate etch, ashing, and deposition processes. Additionally, the system incorporates an advanced monitoring and data collection unit, providing users with a detailed view of the entire process, as well as final post-processing results. Overall, AMAT / APPLIED MATERIALS Centura MxP+ is a robust, advanced PECVD machine that offers a unique solution for the production of high-performance optoelectronic components, solar cells, OLED displays, and other applications. With its range of process capabilities, advanced controllers, and integrated magnetron source, AMAT Centura MxP+ provides users with a powerful, cost-effective option for plasma-based deposition processes.
There are no reviews yet