Used AMAT / APPLIED MATERIALS Centura MxP+ #9351620 for sale
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ID: 9351620
Wafer Size: 8"
Vintage: 1997
Poly etcher, 8"
Wafer shape: SNNF (Notch)
Type: Centura 1 P-2
No SMIF interface
Chamber A, B, C and D: MxP+
Buff robot type: HP
Loadlock: Wide body
Metal buff robot blade
Water detector: Alarm
Wafer sensor: Standard
Smoke detector: Alarm
EMO
AC Rack: Single phase
Monitor and EDP monitor: Standalone
Controller rack: Single phase
Umbilical cables:
Controller to mainframe: 25 ft
Controller to AC rack: 25 ft
RF to chamber coaxial: 50 ft
Pump interface cable: 50 ft
Chamber A:
Chamber type: MxP+
ESC Type: Polymide
IHC Type: MKS 640
Manometer type: 1 Torr
Lid type: Clamp
Slit valve O-ring: Viton
Bias RF match: Standard
OEM 12B RF Generator
No autobias
End point: Monochromator
SEIKO SEIKI 301 Turbo pump
Magnet driver
Simply cathode
Butterfly throttle valve
VAT Gate valve
Standard process kit
Chamber B, C and D:
Chamber type: MxP+
IHC Type: MKS640
Manometer type: 1 Torr
Lid type: Clamp
Slit valve O-ring: Viton
Bias RF match: Standard
OEM 12B RF Generator
No autobias
End point: Monochromator
SEIKO SEIKI 301 Turbo pump
Magnet driver
Simply cathode
Throttle valve: Butterfly
VAT Gate valve
Gases:
Chamber A and B:
Gas / Name / MFC Size / Make / Model
Gas 1 / CL2 / 200 / STEC / SEC-4400MC
Gas 2 / HBR / 200 / STEC / SEC-4400MC
Gas 3 / N2 / 20 / STEC / SEC-4400MC
Gas 4 / CF4 / 200 / STEC / SEC-4400MC
Gas 5 / O2 / 10 / STEC / SEC-4400MC
Gas 6 / O2 / 100 / STEC / SEC-4400MC
Gas delivery:
MFC Maker: STEC
MKS Transducer display
NIPPON SEISEN Mykrolis Filter
Regulator: Veriflo
MKS Transducer
FUJIKIN Valve
Gas connection: Multiline drop
Chiller:
Chiller valve connections: Manifold
Generator rack valve connection: Manifold
Chiller hose size: 3/8 Quick
Valve connection:
Wall: Chamber A, B and C
Cathode: Chamber A, B and C
Power supply: 208 V, 400 A, 60 Hz
1997 vintage.
AMAT / APPLIED MATERIALS Centura MxP+ is a high-performance reactor designed to facilitate the fabrication of semiconductor devices, such as transistors, diodes, and resistors, in the manufacturing of integrated circuits. This reactor is ideal for semiconductor manufacturing processes that require high-temperature processing and precise control over gas flow, pressure, and temperature. The reactor features a patented High-Efficiency Direct Gas Distribution Equipment (HEDGDS) that enables uniform gas distribution and pressure control over the entire chamber. This system eliminates the need for manual gas pumps and allows for precise control of gas flows and pressure. The HEDGDS does not require any gas lines or external connections, making the reactor easier to install and operate. The reactor's internal temperature can be set between 25°C and 1000°C with precision of 0.1°C. This allows for optimized temperature control to ensure accurate process results and efficient workflow management. Further, the MxP+ includes a low-pressure electric pulse unit that eliminates the need for manual vacuum pumps. The electric pulse machine is also capable of maintaining a constant chamber pressure in order to minimize gas breakthrough during thru-process applications. The reactor also boasts an advanced two-phase gas flow protection tool that effectively prevents gas flow contamination. This asset uses a Dynamic Flow Splitter which maximizes the uniformity of the gas flow while simultaneously preventing the cross-contamination of process and carrier gases. The model also features an Active Gas Control Equipment that constantly monitors the chamber pressure and automatically adjusts the flow of the carrier gas to ensure process repeatability. The reactor is also equipped with temperature sensors and a programmable logic controller (PLC) that enable precise temperature control and automated process monitoring. This PLC control system is also capable of executing a sequence of complex events ensuring optimal process quality and efficiency. The reactor also offers a variety of additional features, such as a switch-based power supply and flexible induction heating that provide further control over the semiconductor fabrication process. Furthermore, this reactor is also ETL-listed and RoHS-certified, ensuring that the it meets or exceeds the safety standards of the semiconductor industry. Overall, AMAT Centura MxP+ reactor is an advanced semiconductor fabrication solution that is designed to deliver reliable and consistent results while streamlining manufacturing operations.
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