Used AMAT / APPLIED MATERIALS Centura MxP+ #9351620 for sale

ID: 9351620
Wafer Size: 8"
Vintage: 1997
Poly etcher, 8" Wafer shape: SNNF (Notch) Type: Centura 1 P-2 No SMIF interface Chamber A, B, C and D: MxP+ Buff robot type: HP Loadlock: Wide body Metal buff robot blade Water detector: Alarm Wafer sensor: Standard Smoke detector: Alarm EMO AC Rack: Single phase Monitor and EDP monitor: Standalone Controller rack: Single phase Umbilical cables: Controller to mainframe: 25 ft Controller to AC rack: 25 ft RF to chamber coaxial: 50 ft Pump interface cable: 50 ft Chamber A: Chamber type: MxP+ ESC Type: Polymide IHC Type: MKS 640 Manometer type: 1 Torr Lid type: Clamp Slit valve O-ring: Viton Bias RF match: Standard OEM 12B RF Generator No autobias End point: Monochromator SEIKO SEIKI 301 Turbo pump Magnet driver Simply cathode Butterfly throttle valve VAT Gate valve Standard process kit Chamber B, C and D: Chamber type: MxP+ IHC Type: MKS640 Manometer type: 1 Torr Lid type: Clamp Slit valve O-ring: Viton Bias RF match: Standard OEM 12B RF Generator No autobias End point: Monochromator SEIKO SEIKI 301 Turbo pump Magnet driver Simply cathode Throttle valve: Butterfly VAT Gate valve Gases: Chamber A and B: Gas / Name / MFC Size / Make / Model Gas 1 / CL2 / 200 / STEC / SEC-4400MC Gas 2 / HBR / 200 / STEC / SEC-4400MC Gas 3 / N2 / 20 / STEC / SEC-4400MC Gas 4 / CF4 / 200 / STEC / SEC-4400MC Gas 5 / O2 / 10 / STEC / SEC-4400MC Gas 6 / O2 / 100 / STEC / SEC-4400MC Gas delivery: MFC Maker: STEC MKS Transducer display NIPPON SEISEN Mykrolis Filter Regulator: Veriflo MKS Transducer FUJIKIN Valve Gas connection: Multiline drop Chiller: Chiller valve connections: Manifold Generator rack valve connection: Manifold Chiller hose size: 3/8 Quick Valve connection: Wall: Chamber A, B and C Cathode: Chamber A, B and C Power supply: 208 V, 400 A, 60 Hz 1997 vintage.
AMAT / APPLIED MATERIALS Centura MxP+ is a high-performance reactor designed to facilitate the fabrication of semiconductor devices, such as transistors, diodes, and resistors, in the manufacturing of integrated circuits. This reactor is ideal for semiconductor manufacturing processes that require high-temperature processing and precise control over gas flow, pressure, and temperature. The reactor features a patented High-Efficiency Direct Gas Distribution Equipment (HEDGDS) that enables uniform gas distribution and pressure control over the entire chamber. This system eliminates the need for manual gas pumps and allows for precise control of gas flows and pressure. The HEDGDS does not require any gas lines or external connections, making the reactor easier to install and operate. The reactor's internal temperature can be set between 25°C and 1000°C with precision of 0.1°C. This allows for optimized temperature control to ensure accurate process results and efficient workflow management. Further, the MxP+ includes a low-pressure electric pulse unit that eliminates the need for manual vacuum pumps. The electric pulse machine is also capable of maintaining a constant chamber pressure in order to minimize gas breakthrough during thru-process applications. The reactor also boasts an advanced two-phase gas flow protection tool that effectively prevents gas flow contamination. This asset uses a Dynamic Flow Splitter which maximizes the uniformity of the gas flow while simultaneously preventing the cross-contamination of process and carrier gases. The model also features an Active Gas Control Equipment that constantly monitors the chamber pressure and automatically adjusts the flow of the carrier gas to ensure process repeatability. The reactor is also equipped with temperature sensors and a programmable logic controller (PLC) that enable precise temperature control and automated process monitoring. This PLC control system is also capable of executing a sequence of complex events ensuring optimal process quality and efficiency. The reactor also offers a variety of additional features, such as a switch-based power supply and flexible induction heating that provide further control over the semiconductor fabrication process. Furthermore, this reactor is also ETL-listed and RoHS-certified, ensuring that the it meets or exceeds the safety standards of the semiconductor industry. Overall, AMAT Centura MxP+ reactor is an advanced semiconductor fabrication solution that is designed to deliver reliable and consistent results while streamlining manufacturing operations.
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