Used AMAT / APPLIED MATERIALS Centura Phase II #9281493 for sale

AMAT / APPLIED MATERIALS Centura Phase II
ID: 9281493
MXP System.
AMAT / APPLIED MATERIALS Centura Phase II is a highly efficient, medium throughput reactor equipment that provides high quality, process repeatability and productivity in the fabrication of semiconductor devices. AMAT Centura Phase II is specifically designed for high volume manufacturing of advanced semiconductor processes and is used for various applications such as; gate etch, interlevel dielectric (ILD) deposition, etch stop overlayers, integration of nitride trench fill, and n-type diffusion barrier layers. APPLIED MATERIALS Centura Phase II is capable of processing a wide range of high-volume deposition processes, enabling the production of devices with complex structures and high levels of repeatability and reliability. The reactor's process flexibility allows clients to accommodate a wide range of process targets, when compared to conventional equipment solutions. Centura Phase II is equipped with a patented dual-cassette based loadlock system, with reduced loading and unloading times (down to 15 seconds) with no compromise in vacuum integrity. AMAT / APPLIED MATERIALS Centura Phase II is further equipped with a multi-zone temperature control module that enables precise thermal management, temperature optimization and accurate repeatability. AMAT Centura Phase II offers several additional features, including a rapid recycle post-deposition etch that provides very high throughput and process efficiency. In addition, its robust pulse mode control enables precise real-time control of the film's thickness without any re-adjustment of the reaction parameters for fabricating high quality films. Furthermore, the fully automated delivery unit combines more than a dozen process-relevant parameters and can be remotely monitored and configuration from a host PC. In addition to this, APPLIED MATERIALS Centura Phase II includes a robust hardware platform with equalized process chamber pressure and overall machine performance, allowing improved chamber cleaning temperature, cycle time and deposition uniformity. Centura Phase II also supports batch and rush workloads as well as extended operating cycles, with a reduced downtime feature. AMAT / APPLIED MATERIALS Centura Phase II is an ideal solution for high-volume semiconductor fabrication and is highly reliable for producing high quality and reliable devices with excellent process repeatability. The tool offers high throughput, low temperature operation and cost-effective, process-specific modifications as per requirements.
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