Used AMAT / APPLIED MATERIALS Centura PVD #293625549 for sale

AMAT / APPLIED MATERIALS Centura PVD
ID: 293625549
Wafer Size: 8"
Sputtering system, 8".
AMAT AMAT / APPLIED MATERIALS Centura PVD Reactor is a high-precision, high-performance physical vapor deposition (PVD) equipment. The reactor is designed to process thin-film layers on substrates, such as semiconductor products, at high deposition rates and low substrate temperatures. The system is capable of depositing a variety of materials, including metal nitrides, metal oxides and polysilicon. The unit features a hot wall quartz chamber with a 10.2" dia size and 100 Torr base pressure. The reactor chamber also includes an embedded filament for the deposition of metal thin films. The built-in gas flow machine is designed for uniform gas distribution and the precise control of flow rates and the delivery of precise doses of deposition gases. The reactor is powered by a patented heat exchanger tool, which utilizes three airflow channels with a high thermal efficiency to maintain precise process temperatures while minimizing power consumption. APPLIED MATERIALS/AMAT Centura PVD Reactor is also equipped with a high-resolution digital camera asset for precise end-point detection and a variable speed controller for independent process control. The model also comes with an in-process diagnostic equipment, which provides real-time information on the status of the reactor. The built-in wireless interface allows for communication with external devices such as computers, enabling the collection and processing of reactor data while the system is in operation. In addition, AMAT / APPLIED MATERIALS/APPLIED MATERIALS Centura PVD Reactor offers a variety of security features, such as password protection and user authentication to ensure safe operation. The unit also features a range of environmental sensors, including temperature and pressure sensors, that monitor and control operating conditions for enhanced safety. In summary, AMAT/Centura PVD Reactor is a highly precise and reliable PVD machine that enables accurate thin-film deposition at reduced temperatures. The reactor features a host of features such as an embedded filament, a high-resolution digital camera tool and a real-time diagnostic asset that provide complete process control, effortlessly and safely.
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