Used AMAT / APPLIED MATERIALS Centura PVD #293626643 for sale

AMAT Centura™ PVD reactor is an advanced physical vapor deposition (PVD) tool used for deposition of thin film applications. It is one of the most reliable and cost-effective approach to fabricating advanced technology electronic components. Utilizing high-density electron beam irradiation, APPLIED MATERIALS Centura™ PVD reactor is capable of depositing ultra-thin films onto substrates in an environmentally friendly manner. It is ideal for the production of complex device structures such as stacked gate transistors, buried contact transistors, and other components. AMAT / APPLIED MATERIALS Centura™ PVD reactor comes equipped with a highly controllable deposition chamber, enabling precision control over the substrate temperature during the process. The design also employs an Amorphous Silicon (a-Si) Electron Beam source for higher deposition rates than traditional e-beam source. This design also allows for better control of the deposition rate and to minimize film non-uniformity. Additionally, the high energy electron beam minimizes the energy density on the substrate, allowing it to remain in an optimal state to achieve reliable film deposition. The Centura™ PVD reactor is equipped with an advanced in-situ turbomolecular vacuum pump that can be calibrated to achieve an optimal operating pressure. Additionally, it features an inbuilt mass analysis system to measure the particles present within the deposition chamber in order to ensure the purity of the resulting film. This allows for greater consistency and reliability during the process. The Centura™ PVD also enables cost savings through its economic design. The process can accommodate a wide variety of substrates from powdered metals and glass to metal foil, resulting in fewer costs associated with initial materials. Furthermore, AMAT Centura™ PVD reactor enables higher production yields and faster deposition times which results in cost savings in the form increased labor efficiency and greatly reduced downtime. APPLIED MATERIALS Centura™ PVD reactor is a reliable and cost-effective tool for deposition of thin films. Its advanced features and flexible design make it an ideal choice for a range of applications in advanced electronic device fabrication. By employing high-density electron beam irradiation, it is able to deposit repeatable and reliable films while utilizing minimum energy. It also provides cost savings through faster deposition times and higher production yields, making it a great choice for mass production.