Used AMAT / APPLIED MATERIALS Centura PVD #9239622 for sale

AMAT / APPLIED MATERIALS Centura PVD Reactor is a physical vapor deposition (PVD) tool designed to deposit thin films on substrates with excellent uniformity. It uses advanced multi-hose and multi-gun technology to deposit even, ultra-thin layers of material onto a substrate. The high deposition rate of this tool makes it suitable for a wide range of applications, including semiconductor device fabrication, microelectronic packaging, medical device production, and optical coating deposition. AMAT Centura PVD Reactor has a small footprint and is designed to be used in a variety of settings and configurations. It is a high throughput machine featuring a range of process control capabilities. The process gas delivery system of APPLIED MATERIALS Centura PVD Reactor is designed to ensure optimum gas flow rates and atomizing distributions for maximized deposition uniformity. The integrated exhaust system allows for efficient venting of volatiles and ensures the quality and cleanliness of the deposition environment. The reactor also features a closed-loop temperature control system for accurate temperature management. Centura PVD Reactor offers superior deposition uniformity compared to other PVD tools. The reactor has excellent material loading and dispersion capabilities for finely granulated, precision material from a wide range of sources (gold, silver, aluminum, titanium, zirconium, etc.) and can deposit a wide range of metals and alloys in any desired combination. AMAT / APPLIED MATERIALS Centura PVD Reactor is designed to minimize particle impingement on the substrate surface, ensuring consistently smooth and uniform deposition layers, even when processing extremely thin materials. AMAT Centura PVD Reactor employs advanced automation and control technology to ensure optimal process control. Its built-in chamber process monitoring and control functionality allow precise control throughout the process runs. The tool also features an automated reaction chamber settings menu for easy and rapid adaptation of recipe settings, as well as time and material savings. APPLIED MATERIALS Centura PVD Reactor is an ideal solution for high-volume, production-scale thin film deposition needs. With its superior uniformity, precision process control, and reliable automation, it can be used to make precision films for a variety of applications that require extremely thin and uniform layers.