Used AMAT / APPLIED MATERIALS Centura Radiance #9094639 for sale

AMAT / APPLIED MATERIALS Centura Radiance is one of the most advanced plasma etch systems currently available. It is an etch reactor designed for ultra-high-aspect-ratio manufacturers of semiconductor devices. The reactor is an incredibly versatile tool, offering both single and multichamber configurations and various etch processes. The equipment is capable of achieving sub-100 nanometer resolutions with a moderate etch rate. AMAT Centura Radiance reactor is equipped with several features, allowing the chamber to be executed with a wide range of etching chemistries and etch methods. Electron cyclotron resonance (ECR) technology produces an extremely uniform plasma, while beam assisted deposition, a radical new technology, ensures all materials deposited within the chamber are at an extremely uniform thickness. APPLIED MATERIALS Centura Radiance reactor works by introducing gas plasma into the chamber, creating an energized highly reactive environment. This gas plasma is then used for the etching process, dissolving the material being etched in order to achieve the desired profile. Reactive ion etching allows operators to control the etch depth and profile using multiple passes, and the high energy plasma increases the etch rate. This also enables users to select the appropriate etch rate for each application. With its advanced features, Centura Radiance reactor can be used in a wide range of etch applications, from high aspect ratio on-die metal interconnects to nanostructures for optical testing. The system also has applications in high dielectric constant (k) etching and MEMS fabrication. The Core AMAT / APPLIED MATERIALS Centura Radiance Etch Unit consists of four separate components: an easy-to-use front-end interface, a robust vacuum machine, a unique quartz etching chamber, and an intelligent, high-precision control tool. This combination of components creates a powerful platform for etching applications. The high-performance spectrometer, high-resolution digital optics asset, and chemical analysis capabilities are also used to control and monitor the etch process. AMAT Centura Radiance offers reliable, repeatable etch results with a wide range of etch chemistries. Whether it's single or double-sided etching, high aspect ratio or high process uniformity, full wafer etch or line pattern etch, APPLIED MATERIALS Centura Radiance is capable of meeting challenging etch requirements. This etch reactor is a powerful tool in the development of high-performance semiconductor devices.