Used AMAT / APPLIED MATERIALS Centura RTP XE+ #9118968 for sale

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ID: 9118968
Wafer Size: 8"
Chamber, 8" Includes: Gas panel Chamber umbilicals SCR Driver Seiki Denko boxes Power rack.
AMAT / APPLIED MATERIALS Centura RTP XE+ is an advanced thermal processing reactor platform that is designed for plasma-assisted surface modification for a variety of substrates and materials. This equipment is based on AMAT Centura series of plasma-enhanced systems and features a patented closed-loop Microwave Plasma Excitation source (MPX) that provides superior repeatability for etching, deposition, and surface modification applications. With its unique reactor design and advanced control platform, AMAT Centura RTP XE+ is capable of intercepting and controlling the energy of microwave, pulsed plasma, and direct gas plasmas in order to achieve uniform processes. APPLIED MATERIALS Centura RTP XE+ is designed to process all types of materials, including metal oxides, nitrides, carbides, and other dielectric materials. It is capable of both specific and conventional thermal processes and adaptive etching and is capable of processing up to 100 substrates simultaneously. The system is equipped with two 20KV 300mm process torches that allow for simultaneous, highly controllable processing of different substrates, making this unit ideal for production-level etching and deposition applications. Centura RTP XE+ features an engineered chamber that increases machine performance and reduces process time. It is also equipped with a Variable Pressure Control (VPC) tool that allows the user to adjust the pressure in the reactor in order to optimize processing conditions. This asset also features a unique dual-frequency RF Plasma Control Model (PPC), which allows for precise control of plasma parameters such as average plasma power, plasma stability, and chemical selectivity. The equipment is equipped with a comprehensive, easy-to-operate Digital Process Control (DPC) console that provides excellent feedback and control capabilities. The DPC console allows users to adjust various operational parameters, monitor system performance, and adjust for maximum process repeatability. It provides diagnostic information and can also be used to store recipes and process data for traceability and optimization purposes. AMAT / APPLIED MATERIALS Centura RTP XE+ is an advanced thermal processing reactor platform that provides reliable, repeatable results for production-level etching and deposition applications. With its engineered chamber and precision process control, this unit allows users to effectively, uniformly, and consistently process different types of substrates. This machine has many other features that provide users the flexibility to adjust process parameters and control the energy of plasmas to achieve optimal results.
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