Used AMAT / APPLIED MATERIALS Centura RTP XE #9188732 for sale

AMAT / APPLIED MATERIALS Centura RTP XE reactor is a sophisticated piece of equipment designed to meet the demands of the semiconductor industry. The reactor is specifically designed for etching and depositing thin films and is an effective tool for deposition in many diverse production processes. The RTP is used in many applications in the semiconductor industry such as gate oxide formation, silicide formation, diffusion barrier and adhesion layer deposition, low-k dielectrics deposition, and topology control. The XE is an advanced version of the reactor incorporating several advanced features such as improved process control. AMAT Centura RTP XE is a horizontal furnace type reactor with a 6" beamline. The reactor has a segmented thermal zone equipment which provides excellent uniformity within each zone and fast cycle times. The furnace has a high-performance high-precision deposition system with advanced process control capabilities. The Centura delivers high deposition rate and uniformity with superior thermal and process control. It also features a low-pressure electron cyclotron resonance source, which allows for high-level performance and uniformity even at low-pressure with significant savings in process costs. The RTP XE incorporates advanced features such as dual-source capability, ultra-high precision gas handling, and advanced wafer handling and monitoring. It offers an advanced multi-zone controller with built-in software for precise process control. Advanced particle control features are available, providing superior and repeatable results. In addition, the unit supports on-wafer electrical probing for precise process monitoring and control. The machine also supports a wide range of tool configurations including options for non-oxidizing heating for materials with density and composition challenges. APPLIED MATERIALS Centura RTP XE is a powerful and reliable reactor designed for high etch and low deposition applications. It is capable of providing the speed, accuracy, and repeatability required by the industry. Its advanced features and process control capabilities provide tremendous value to semiconductor manufacturers seeking to improve their process performance and yield.