Used AMAT / APPLIED MATERIALS Centura RTP XE #9216582 for sale

AMAT / APPLIED MATERIALS Centura RTP XE (Reactive Thermal Processing) is a reactor designed for high performance in advanced semiconductor device fabrication. The reactor features full automation, with a user-friendly interface and process parameters that can be quickly and accurately programmable. Its full-featured environment enables in-situ monitoring of critical processing parameters such as temperature, pressure, and gas composition. AMAT Centura RTP XE reactor is designed with a long-lifetime insulation equipment that helps maintain a consistent temperature and atmosphere inside the system. This enables repeatable and dependable results for a variety of application processes. The chamber also employs a multi-zone heating profile in order to simultaneously heat up to four different zones within the reactor. APPLIED MATERIALS Centura RTP XE features a variety of chamber sizes, depending on the application: the largest size offers a 13-inch chamber diameter. In addition, there is a choice of liner materials that can be selected based on process needs; the choices include quartz, graphite, and stainless steel. Centura RTP XE reactor is equipped with both a low and medium-pressure propane delivery unit. This allows for repeatable process times, since the low-pressure machine delivers a higher rate of propane while the medium-pressure tool yields a lower rate. This dual-delivery asset helps maintain a steady pressure and temperature throughout the reaction process. AMAT / APPLIED MATERIALS Centura RTP XE reactor is designed to be robust and reliable in the face of high-temperatures and long processing times. It has both an advanced thermal control model and a patented atmospheric pressure control technology, which help to ensure consistent output throughout the duration of the reaction cycle. It also has a range of alarm and safety features that protect the device and its users from unexpected faults. AMAT Centura RTP XE reactor includes a wide range of auxiliaries, including a nitrogen purge equipment to ensure an alternative gas supply in case the propane supply fails, and a mass flow controller to adjust the flow of gas as needed. It also has a variable-speed fan for even heat distribution and a fast-cleaning feature to clear out debris such as dust and particles from the chamber. Finally, APPLIED MATERIALS Centura RTP XE reactor is equipped with the industry-leading CCDopticTM optical system. This unit helps control the reaction environment by providing precise monitoring of both temperature and pressure, as well as having powerful analytical capabilities. This makes it possible to fine-tune process parameters to yield consistent and high-quality results. In summary, Centura RTP XE reactor helps advanced semiconductor device fabrication operations achieve high performance and productivity. Its reliable and repeatable nature, combined with its auxiliaries and CCDopticTM optical machine, make it an ideal choice for many industrial-level applications.