Used AMAT / APPLIED MATERIALS Centura RTP XE #9237240 for sale
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ID: 9237240
Wafer Size: 8"
Vintage: 2000
RTP System, 8"
Wafer specification:
Wafer shape: SNNF, JMF
SMIF Interface: No
System information:
P/N: D150-76207
Loadlock type: WBLL
Hard disk drive (HDD)
System umbilical
Signal tower
(8) Wafer sensors
OTF
Chamber A:
RTP XE
Process: ISSG
SCR Model: P1161
Temp probe: SEKIDENKO
Manometer model:
1000 TORR: MKS TYEP624
100 TORR: MKS TYEP624
Chamber B:
RTP XE
Process: ISSG
SCR Model: P1161
Temp probe: SEKIDENKO
Manometer model:
1000 TORR: MKS TYEP624
100 TORR: MKS TYEP624
Chamber E:
Cooldown
Chamber F:
Cooldown
System monitor:
Monitor 1: Through the wall
Monitor 2: Stand alone
Monitor 3: NO
Mainframe information:
System placement: Stand alone
Robot type: HP
L/L Wafer mapping
Robot blade
(8) W/F Slippage sensors
N2 Purge
Gas pallet configuration:
Valves: FUJIKIN 5 Ra max
Filters: Millipre
Transducers
Regulators: AD TECHNOLOGY
SLD Gas lines fees: Top feed
System cabinet exhaust: Top
Electrical:
Line frequency: 50 / 60 Hz
System power: 400 A
UPS Power.
2000 vintage.
AMAT / APPLIED MATERIALS Centura RTP XE is a high-performance, single-wafer substrate-confined rapid thermal processing (RTP) reactor system. This robust, compact reactor is designed for precise control and optimization of the RTP parameters, allowing it to deliver uniform thermal performance and reliable operation. AMAT Centura RTP XE features a double tower with independent control of each tower for optimized temperature homogeneity. The epitaxial reactor is engineered with a hundred-watt (100W) halogen lamp heating element, which provides repeatable performance and homogeneity across the heating zones. APPLIED MATERIALS Centura RTP XE uses an advanced platform to provide real-time diagnostics and monitoring, enabling users to optimize the process parameters and improve process quality. Centura RTP XE is engineered with two pneumatically driven pneumatic shutters that provide precise control of substrate temperature. The computer-controlled RTP chamber provides an excellent thermal environment for maximum thermal-processing efficiency and reliable operation. With its incorporated SafetyLock feature, AMAT / APPLIED MATERIALS Centura RTP XE ensures process and safety compliance while providing secure access to the chamber. The SafetyLock feature ensures a secure seal of the chamber while preventing inadvertent reactor starts. AMAT Centura RTP XE is engineered to provide an optimal thermal environment for RTP applications. Its advanced design includes multiple-zone optical heating, high optical reflectivity of the chamber walls, and uniform temperature distribution across the substrate. The chamber materials are specially selected and manufactured to ensure robust thermal performance for short-duration, high-temperature applications. The top-hat thermal uniformity control ensures exceptional performance and minimal temperature gradients across the substrate surface. The control system for APPLIED MATERIALS Centura RTP XE is specially designed for precise control and monitoring of the RTP process. A programmable logic controller (PLC) enables automated chamber control, complete with real-time diagnostics. This advanced system is capable of controlling multiple process parameters simultaneously, allowing users to optimize their thermal processing to meet specific requirements. The PLC also provides fault diagnostics in case of unexpected process conditions. Centura RTP XE is the ideal tool to achieve optimal substrate coverage and temperature uniformity in RTP applications. Its robust design provides superior performance, improved process control, and real-time diagnostics, giving users confidence in their thermal process capabilities.
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