Used AMAT / APPLIED MATERIALS Centura RTP XE #9243040 for sale

AMAT / APPLIED MATERIALS Centura RTP XE is a reactive-ion-etching (RIE) reactor equipment designed for advanced, high-volume manufacturing. This state-of-the-art technology uses plasma-based etching to etch fine line features into a wide variety of materials, including oxide/nitride/metal materials. At the core of the system is the Advanced Reactive Ion Etch (ARIE) technology. This patented plasma technology features a shielded power supply, multiple process reactors, and multiple plasma sources to enable fine-tuned etching. The unit is optimized for integrated circuit (IC) patterning with superior etch uniformity, high throughput rates, and repeatable repeatability in every wafer. AMAT Centura RTP XE includes a compact, high-torque, low-noise process chamber with an industry-leading flow dynamic. This optimized process chamber ensures consistent results with low process noise and wide-ranging process selectivity. The machine includes a variable frequency RF generator, which allows for superior control of plasma density and variation of etch rate. In addition, APPLIED MATERIALS Centura RTP XE supports a wide range of optical source configurations, enabling high-precision, uniform etching of even the smallest features. Centura RTP XE also features an advanced process control suite which enables automated, user-defined process sequences and real-time data collection and analysis. The tool supports a wide range of wafer sizes (200 mm and 300 mm) and feature sizes (in the order of a few nanometers). The advanced chamber features a workflow automation asset which tracks and monitors process performance from start to finish, ensuring consistent and predictable results. The model also offers extensive reporting and analytics capabilities for process optimization and validation. This RIE reactor equipment offers superior performance at an attractive price. Thanks to its advanced control suite and comprehensive data handling capabilities, AMAT / APPLIED MATERIALS Centura RTP XE is ideal for applications in large-scale production processes, semiconductor device fabrication, and light lithography. With its flexible, high-yield, low-cost approach, AMAT Centura RTP XE is a valuable tool for any industrial or research laboratory working on fine-scale etching processes.