Used AMAT / APPLIED MATERIALS Centura SA CVD #293767652 for sale

AMAT / APPLIED MATERIALS Centura SA CVD is a semi-atmospheric, single-wafer, low-cost thermal chemical vapor deposition (CVD) reactor designed to produce extremely uniform and conformal thin films on a wide range of crystalline and amorphous substrates. Suitable for use in semiconductor device manufacturing, this reactor is capable of delivering very precise characteristics with low process complexity and highly reliable performance. AMAT Centura SA CVD has a single high-temperature reactor chamber that can provide uniformity of temperature across the entire substrate. This chamber allows the use of a wide range of temperature profiles for a variety of materials. The temperature range of the reactor is 300°C to 700°C. The reactor's large chamber also allows for a variable pressure range of 1 Bar to 10 Bar depending on the gas combination used. This allows the user to precisely control the chemical reaction occurring during the deposition process. APPLIED MATERIALS Centura SA CVD reactor is designed for low-power consumption, with a power rating of 3.2 kW to 4.7 kW. Its two independent gas flow controllers provide the internals of the reactor with a precise mix of gases, allowing for the deposition of high-quality film layers with very short cycle times. The gold-plated re-entrant shower heads provide enhanced uniformity of heat transfer and excellent temperature control across the single wafer, facilitating extremely uniform film deposition. Centura SA CVD reactor also features an advanced heating system with highly efficient insulation. An elliptical electrostatic filter with a very high collection efficiency is used to achieve low particle levels in the reactor chamber. In addition, the peripheral systems within the reactor are designed as an integrated unit and encased in a stainless steel enclosure that is dimensioned for optimal heat transfer and reliable operation. AMAT / APPLIED MATERIALS Centura SA CVD reactor is designed to suit a wide range of materials and applications. It is suitable for deposition of low-temperature silicon oxide films and other polymers on silicon and other crystalline wafers as well as back planes and conforming layers for a variety of thin-film devices. Using this reactor, precise thin-film deposition is possible and material characterization is aided by its advanced design. AMAT Centura SA CVD reactor is a highly reliable reactor that is easy to use due to its simple operation and setup. Even inexperienced personnel can safely operate the CVD reactor, thanks to its fool-proof control system and low-maintenance design. Its intuitive GUI displays step-by-step instructions to facilitate efficient operation, while fault indicators alert users regarding any issues. The reactor is equipped to communicate through Ethernet and other external devices for remote monitoring.