Used AMAT / APPLIED MATERIALS Centura SA CVD #9116524 for sale

AMAT Centura® SA CVD is a chemical vapor deposition (CVD) reactor designed and manufactured by APPLIED MATERIALS. It is most commonly used for the production of semiconductor devices and circuits. The CVD reactor works by using a combination of heat and gaseous reactants to deposit a thin film of material onto a substrate, allowing for the formation of semiconductor devices. AMAT / APPLIED MATERIALS Centura® SA CVD reactor is a single-wafer diffusion reactor that provides accurate, high-yielding deposition and etching processes. The reactor uses an advanced, pulsed power source to deliver reliable, repeatable processes that yield higher quality films. Temperature control is also very precise in the CVD reactor, with the ability to accurately and controllably reach temperatures up to 1050°C (1922°F). The reactor chamber is designed to utilize direct flow technology for improved uniformity and particle control. It also features an in-situ monitoring feature which enables continuous real-time process monitoring, allowing the user to make any necessary modifications without wasting any time or materials. The internal walls of the reactor are coated with a special refractory material which helps to ensure uniform deposition. AMAT Centura® SA CVD reactor also provides integrated automation and diagnostic features for quick and easy process modification. The reactor's automated control system precisely controls multiple deposition chambers, with the ability to monitor process times and temperatures and adjust them if necessary. Additionally, the reactor also features advanced diagnostic capabilities which can detect any problems, allowing for quick and easy adjustment. APPLIED MATERIALS Centura® SA CVD reactor is designed to provide maximum productivity and efficiency. Its automated features and precise temperature control ensure uniform film deposition over the entire substrate, while its intuitive software is perfect for quickly and easily setting up, controlling, and monitoring multiple deposition chambers. Furthermore, its advanced diagnostic capabilities are designed to help avoid costly downtime, ensuring greater yields with minimal waste.