Used AMAT / APPLIED MATERIALS Centura TAO #9230336 for sale

AMAT / APPLIED MATERIALS Centura TAO
ID: 9230336
System.
AMAT / APPLIED MATERIALS Centura TAO (Thermal Atomic Layer Oxygen) reactor is a semi-atmospheric process tool designed to provide high-performance, low-cost deposition technologies for the advanced materials industry. AMAT Centura TAO reactor is capable of achieving a high degree of control over the deposition process, allowing for exact repeatability of the deposition parameters. This makes it ideal for industries focusing on semiconductor, nanoscale materials, and optoelectronic applications. The reactor's design is based on thermal processing which improves process uniformity and repeatability. At the process level, the reactor acts like a furnace, allowing the deposition to occur at the molecular level without the need for a liquid-phase deposition process. The flexibility of the reactor design allows for a range of process options, such as oxidation, diffusion, and dielectric layers. The reaction chamber of APPLIED MATERIALS Centura TAO is located in an isolated vacuum environment, which is temperature-controlled and pressure-controlled. This ensures that the output quality and throughput are consistent and repeatable. The reactor utilizes a two-step process, which combines chemical vapor deposition (CVD) with atomic layer deposition (ALD). At the first step, precursor molecules are released in the vacuum to form a thin film on the material to be deposited. At the second step, the substrate is then exposed to an oxygen-containing plasma, which further modifies the film. This two-step process allows for customization and fine tuning of the deposited layer's characteristics. Centura TAO reactor is also known for being easy to use, requires minimal maintenance, and produces minimal waste. It is capable of achieving the highest quality of deposition with maximum efficiency, making it well-suited for all types of advanced materials applications. The reactor's temperature and pressure control allows for precise control over the microstructure of the deposited layers, giving customers the ability to customize their products to exceptional levels of detail. In conclusion, AMAT / APPLIED MATERIALS Centura TAO is a reliable, high-performance, semi-atmospheric process tool that gives customers the ability to make exact reproduction of their deposition parameters for advanced materials applications. Its two-step process and precise temperature and pressure control provide users with the highest quality and highest efficiency of deposition. With all these features and benefits, AMAT Centura TAO is definitely a must-have tool for anyone in the industry.
There are no reviews yet