Used AMAT / APPLIED MATERIALS Centura Tectra #9086223 for sale

AMAT / APPLIED MATERIALS Centura Tectra reactor is a highly advanced etch cluster tool used for plasma processing. It has been designed to deliver accurate and consistent process control for etch and deposition applications in a wide variety of industries. The reactor is ideal for research and development, as well as high-volume production, and offers superior performance and low running costs. AMAT Centura Tectra reactor is equipped with an advanced set of features that enable it to take advantage of the latest etching and deposition technologies, including the Centura 3D etch and deposition head. This head is specifically designed to enable the use of high-temperature and high-pressure plasma processing, allowing for excellent control over the etching and deposition processes. The head also features a robust construction that enables it to handle temperature extremes and high pressures. The reactor is also equipped with two main pumps that are dedicated to etching and deposition applications respectively. Both are driven by a high-performance motor, ensuring that they provide smooth and efficient operation. The main pumps are complemented by several additional pumps, including a high-pressure low-pressure pump and a vacuum pump for controlling the pressure inside the reactor. In addition, APPLIED MATERIALS Centura Tectra reactor features an advanced controller, which allows for easy operation and control of the etching and deposition processes. This controller can be used to modify the temperature in the reactor, the pressure, the flow rate, the voltage, and the total power input. The controller also enables the user to adjust the time frame within which the etching and deposition will be performed. Centura Tectra reactor is also equipped with an ion source module, which can be used to generate additional ions during the etching and deposition processes. The advanced power control system in this module ensures that the ions are evenly distributed, resulting in uniformed etch depth and deposition patterns. The ion source module is also equipped with several filters that are designed to filter out any unwanted gases or ions, and to reduce any contamination during the etching and deposition operations. All in all, AMAT / APPLIED MATERIALS Centura Tectra reactor is an advanced etch cluster tool that is capable of providing high performance and excellent control over the etch and deposition processes. With its robust construction, powerful motors, and advanced controller, it is an ideal choice for research and development, as well as high-volume production.