Used AMAT / APPLIED MATERIALS Centura Ultima HDP CVD #115605 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 115605
Wafer Size: 8"
Vintage: 2000
Etcher, 8"
(2) Ultima chambers
Technology :IMD
Wafer Size : 200mm
Wafer Shape : SNNF (Semi Notch No Flat)
Software Version : B4.3.14
Ch A : Ultima HDP-CVD
Ch B : Ultima HDP-CVD
Ch D : Ultima + HDP-CVD
Ch E : Multislot Cool Down
Ch F : Orienter
CHAMBER A,B Ultima HDP-CVD :
Nozzle : Long/Long Side
Clean Gas Distribution : Baffle
Turbo Pump : Ebara ET1600WS w/ HVA
Wafer Temperature Monitoring : Yes
Top Gas Feed : Without Top O2
Dual Independent He Control : Standard 10/10 TORR
Clean Method : Microwave
CHAMBER D - Ultima + HDP-CVD :
Nozzle : Long/Long Side
Clean Gas Distribution : Baffle
Turbo Pump : Ebara ET1600WS w/ HVA
Wafer Temperature Monitoring : Yes
Top Gas Feed : Without Top O2
Dual Independent He Control : Standard 10/10 TORR
Clean Method : Top Mount
Line Frequency : 60Hz
Line Voltage : 200/208V
Line Amperage : 600A Platform
EMO type : Turn to release EMO
EMO Guard Ring : Yes
System Labels : English w/Chinese Non-simplified
System Smoke Detector : Controller
EXISTING MAINFRAME :
Mainframe Type : Ultima HDP w/Multislot
Frame Type : Standard Frame
System Placement : Through the Wall
Mainframe Skins : No
Mainframe Exhaust Duct : No
Mainframe Facilities Connection : Back
Robot Type : HP Robot
Robot Blade : Ceramic
Narrow body Loadlocks : Cassette Present Sensor
Loadlock Wafer Mapping : Basic
N2 Purge Type : STEC 4400MC 10 Ra Max
Gas Panel Surface Finish : Standard Gas Panel
MFC Type : STEC 4400MC 10 Ra Max
Valves : Fujikin 5 Ra Max
Filters : Pall Ni 10 Ra Max
Transducers : MKS w/ Display
Regulators : Veriflo
System Cabinet Exhaust : Top
Gas Panel Gas/Flow Direction Labels : Yes
APC Seriplex Cover : Yes
Gas Panel Doors : Solid
Gas Pallet Configuration :
Chamber A, B, D
Gas Stick/Process Gas/MFC size/Regulator/Transducer
#1 SiF4 100 Y Y
#2 O2 400 Y Y
#3 SiH4 200 Y Y
#4 Ar 300 Y Y
#5 SiH4 20 Y Y
#6 Ar 50 Y Y
#7 NF3 2000 Y Y
#8 Ar 2000 Y Y
RF Generator Rack - Ultima Gen. Rack
Chamber A, B :ASTEX 80S09mW (2)
Chamber D : ENI Genesis Nova -50A-04
Ultima Stand-Alone RF Generator Rack : Yes
Generator Rack Cooling - RF Gen Rack Manifold with Quick Disconnect
Ultima Gen Rack H20 Connection - Barbed Brass
Heat Exchanger : SMC Thermo
System Controller Signal Cable Length : 55ft
RF Gen Rack Cable Length : 50ft
Ultima Stand-Alone Generator Rack : 98 ft
HX Hose Length : 50ft
HX Cable Length : 50ft
Pump Cable : 50ft
Ultima Microwave Generator Cable Length : 50 ft
Ultima WTM Cable Length : 32.8 ft (10m)
Vacuum Pumps, Exhaust Scrubber not included in sale
System Can be inspected
Currently Crated
2000 vintage.
AMAT Centura Ultima High Density Plasma (HDP) chemical vapor deposition (CVD) reactor is an all-in-one process equipment that offers precise, accurate, and cost effective deposition of films and films stacks, over both small and large wafer sizes. This CVD reactor utilizes highly efficient plasma sources at high deposition rates in order to deposit ultra-thin films on a range of complex substrates. This high-performance tool promises a maturing process window, incredible repeatability, and unparalleled performance and robustness in the fab environment. AMAT / APPLIED MATERIALS Centura Ultima HDP CVD utilizes advanced plasma sources at high powers and frequencies to ensure precise control over deposition rates and uniformity. This system is designed to handle high-density plasma operations, enabling the user to realize high uniformity and high deposition throughput over a range of thin-film materials. The unit provides accurate, repeatable deposition over large (200 mm) and small (150 mm) diameter substrates, making it an industry-leading reactor for film deposition on complex substrates. AMAT Centura Ultima HDP CVD machine is designed with a range of safety and ergonomic features, ensuring user safety and ease of operation. The robot arm is designed to offer secure and reliable wafer transfer, minimizing total process cycles. The single-chamber design of the tool ensures enhanced safety due to the elimination of chamber-to-chamber transfer operations. The optimized ergonomics of the asset provide a safe environment for personnel, reducing the potential for operator errors and other accidents. APPLIED MATERIALS Centura Ultima HDP CVD is a high-performance model that is capable of precise and accurate film deposition. This equipment uses advanced plasma sources and provides high uniformity over a range of substrate sizes and shapes. This system is ergonomic, safe, and fully compatible with a range of advanced thin-film materials. This CVD reactor is an ideal tool for film deposition in both large-scale semiconductor fabrication facilities and research and development environments.
There are no reviews yet