Used AMAT / APPLIED MATERIALS Centura Ultima HDP CVD #115605 for sale

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ID: 115605
Wafer Size: 8"
Vintage: 2000
Etcher, 8" (2) Ultima chambers Technology :IMD      Wafer Size : 200mm      Wafer Shape : SNNF (Semi Notch No Flat)      Software Version : B4.3.14 Ch A : Ultima HDP-CVD Ch B : Ultima HDP-CVD Ch D : Ultima + HDP-CVD Ch E : Multislot Cool Down Ch F : Orienter CHAMBER A,B Ultima HDP-CVD : Nozzle : Long/Long Side Clean Gas Distribution : Baffle Turbo Pump : Ebara ET1600WS w/ HVA Wafer Temperature Monitoring : Yes Top Gas Feed : Without Top O2 Dual Independent He Control : Standard 10/10 TORR Clean Method : Microwave CHAMBER D - Ultima + HDP-CVD : Nozzle : Long/Long Side Clean Gas Distribution : Baffle Turbo Pump : Ebara ET1600WS w/ HVA Wafer Temperature Monitoring : Yes Top Gas Feed : Without Top O2 Dual Independent He Control : Standard 10/10 TORR Clean Method : Top Mount Line Frequency : 60Hz Line Voltage : 200/208V Line Amperage : 600A Platform EMO type : Turn to release EMO EMO Guard Ring : Yes System Labels : English w/Chinese Non-simplified System Smoke Detector : Controller EXISTING MAINFRAME : Mainframe Type : Ultima HDP w/Multislot Frame Type : Standard Frame System Placement : Through the Wall Mainframe Skins : No Mainframe Exhaust Duct : No Mainframe Facilities Connection : Back Robot Type : HP Robot Robot Blade : Ceramic Narrow body Loadlocks : Cassette Present Sensor Loadlock Wafer Mapping : Basic N2 Purge Type : STEC 4400MC 10 Ra Max Gas Panel Surface Finish : Standard Gas Panel MFC Type : STEC 4400MC 10 Ra Max Valves : Fujikin 5 Ra Max Filters : Pall Ni 10 Ra Max Transducers : MKS w/ Display Regulators : Veriflo System Cabinet Exhaust : Top Gas Panel Gas/Flow Direction Labels : Yes APC Seriplex Cover : Yes Gas Panel Doors : Solid Gas Pallet Configuration : Chamber A, B, D Gas Stick/Process Gas/MFC size/Regulator/Transducer #1 SiF4 100 Y Y #2 O2 400 Y Y #3 SiH4 200 Y Y #4 Ar 300 Y Y #5 SiH4 20 Y Y #6 Ar 50 Y Y #7 NF3 2000 Y Y #8 Ar 2000 Y Y RF Generator Rack - Ultima Gen. Rack Chamber A, B :ASTEX 80S09mW (2) Chamber D : ENI Genesis Nova -50A-04 Ultima Stand-Alone RF Generator Rack : Yes Generator Rack Cooling - RF Gen Rack Manifold with Quick Disconnect Ultima Gen Rack H20 Connection - Barbed Brass Heat Exchanger : SMC Thermo System Controller Signal Cable Length : 55ft RF Gen Rack Cable Length : 50ft Ultima Stand-Alone Generator Rack : 98 ft HX Hose Length : 50ft HX Cable Length : 50ft Pump Cable : 50ft Ultima Microwave Generator Cable Length : 50 ft Ultima WTM Cable Length : 32.8 ft (10m) Vacuum Pumps, Exhaust Scrubber not included in sale System Can be inspected Currently Crated 2000 vintage.
AMAT Centura Ultima High Density Plasma (HDP) chemical vapor deposition (CVD) reactor is an all-in-one process equipment that offers precise, accurate, and cost effective deposition of films and films stacks, over both small and large wafer sizes. This CVD reactor utilizes highly efficient plasma sources at high deposition rates in order to deposit ultra-thin films on a range of complex substrates. This high-performance tool promises a maturing process window, incredible repeatability, and unparalleled performance and robustness in the fab environment. AMAT / APPLIED MATERIALS Centura Ultima HDP CVD utilizes advanced plasma sources at high powers and frequencies to ensure precise control over deposition rates and uniformity. This system is designed to handle high-density plasma operations, enabling the user to realize high uniformity and high deposition throughput over a range of thin-film materials. The unit provides accurate, repeatable deposition over large (200 mm) and small (150 mm) diameter substrates, making it an industry-leading reactor for film deposition on complex substrates. AMAT Centura Ultima HDP CVD machine is designed with a range of safety and ergonomic features, ensuring user safety and ease of operation. The robot arm is designed to offer secure and reliable wafer transfer, minimizing total process cycles. The single-chamber design of the tool ensures enhanced safety due to the elimination of chamber-to-chamber transfer operations. The optimized ergonomics of the asset provide a safe environment for personnel, reducing the potential for operator errors and other accidents. APPLIED MATERIALS Centura Ultima HDP CVD is a high-performance model that is capable of precise and accurate film deposition. This equipment uses advanced plasma sources and provides high uniformity over a range of substrate sizes and shapes. This system is ergonomic, safe, and fully compatible with a range of advanced thin-film materials. This CVD reactor is an ideal tool for film deposition in both large-scale semiconductor fabrication facilities and research and development environments.
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