Used AMAT / APPLIED MATERIALS Centura Ultima HDP #145562 for sale

AMAT / APPLIED MATERIALS Centura Ultima HDP (High Density Plasma) is a chemical vapor deposition (CVD) reactor that has been specifically designed to provide an ultra-high plasma density. This reactor boasts a wide range of capabilities, enabling the deposition of complex metallic and dielectric films for a range of applications. Word Count: 169 AMAT Centura Ultima HDP utilizes the latest advancements in CVD technology to provide the highest deposition rates possible. This reactor is based on a unique closed chamber design which provides a higher levels of plasma containment and a better control over the process. Inside the chamber, the HDP is equipped with a high-density electron cyclotron resonance (ECR) plasma source capable of reaching a plasma density of up to three times higher than a conventional plasma source. This higher plasma density allows for greater reactivity and deposition rates, leading to shorter deposition times and increased throughput. In addition, the HDP is also equipped with an integrated deposition uniformity monitor. This monitor helps ensure that the deposition process is within a preset specification, allowing any necessary adjustments to be made quickly and easily. This uniformity monitor also helps provide high yield and repeatability for complex deposition processes, resulting in reliable and consistent deposition phases. The HDP reactor also employs a unique cooling equipment which helps to reduce and dissipate the heat generated from the plasma in order to maintain a uniform temperature in the chamber during high-rate depositions. This cooling system also helps reduce the workload on the deposition unit, resulting in fewer restarts and longer maintenance intervals. Finally, the HDP reactor is equipped with advanced process control and diagnostics capabilities. This allows for quick and accurate chamber diagnostics and adjustment of deposition parameters to optimize the performance of the deposition processes. This advanced control machine helps ensure that the deposition processes are running at peak efficiency and yields. Overall, APPLIED MATERIALS CENTURA ULTIMA+ HDP is an advanced reactor that utilizes the highest levels of technology to enable the highest deposition rates, uniformity, and reliability. This reactor is ideal for a wide range of applications and provides unparalleled performance for all CVD deposition processes. Word Count: 500