Used AMAT / APPLIED MATERIALS Centura Ultima HDP #9074544 for sale

AMAT / APPLIED MATERIALS Centura Ultima HDP reactor is a high-density plasma (HDP) deposition equipment that is used to deposit thin film layers and other materials onto pre-deposition substrates. It is a purpose-designed, high throughput system that uses advanced technology to produce highly uniform, ultra-thin barrier and contact layers. The reactor is a dual-chamber, single-wafer unit that features both HDP and ultra-high-density plasma (UHDP) deposition capabilities. It is designed for high-volume manufacturing applications, delivering the highest throughput and performance, and with the lowest cost of ownership. The machine is also equipped with a fully-automated process control tool and advanced monitoring systems, so that users can optimize their processes while ensuring local, secure control over their assets. AMAT Centura Ultima HDP reactor utilizes the unique HDP process to deposit layers that are thinner and more uniform than conventional technologies. The HDP process uses high-energy plasma in conjunction with specialty gases to deposit thin-film layers as thin as 1 nanometer (nm). This thin-film layer deposition can be used to create structures and devices, such as: devices for advanced 3D electronics, photonics, optoelectronics and MEMs, as well as thin-film coatings for advanced optics, nano-electronics and sensors. APPLIED MATERIALS CENTURA ULTIMA+ HDP reactor also offers the UHDP process, which utilizes ultra high-energy plasma to deposit ultra thin-film layers; as thin as 0.1 nm. The UHDP process is ideal for exact metallization of contact surfaces, for precise downgating applications, self-aligned contact hole features, and interface deposition technologies. AMAT / APPLIED MATERIALS CENTURA ULTIMA+ HDP reactor also features an integrated buffer asset, which helps to reduce thermal and pressure spiking, thus providing a more precise control of the deposition process. The integrated buffer also helps to reduce downtime, as the user can select exactly the right process parameters for each job on the fly. Centura Ultima HDP reactor is an ideal thin-film deposition model for research and manufacturing applications. It delivers superior thin-film deposition performance, throughput and flexibility, while providing cost-effective operation. The reactor is an excellent choice for those looking for a reliable and cost-effective solution to their thin-film deposition requirements.