Used AMAT / APPLIED MATERIALS Centura Ultima HDP #9176603 for sale

AMAT / APPLIED MATERIALS Centura Ultima HDP is a multi-chamber advanced process reactor, designed to meet the needs of the modern semiconductor manufacturing environment. The reactor is designed to provide high throughput, with advanced chemical vapor deposition (CVD) capabilities and a wealth of automation options. The equipment is designed for rapid throughput, with ramp rates of up to 10,000°C/minute, and is capable of achieving pressures of up to 10 Torr with low internal pressures, ensuring a clean process environment. AMAT Centura Ultima HDP features components that are built to last, including Silicon Carbide walls and the latest Quartz Crystal Resonator technology, providing reliability and repeatability of process parameters. APPLIED MATERIALS CENTURA ULTIMA+ HDP provides the chemist and engineer process flexibility, with a range of adjustable parameters that can be manipulated from the LCD touch screen. This device gives engineers total control over the CVD process, enabling them to set different pressure and temperature profiles for each chamber, with a Pulsed-RF option available for enhanced step rate and deposition uniformity. This system is designed for the deposition of oxides, nitrides, and silicon based films, making it ideal for the production of complex semiconductor-based components. CENTURA ULTIMA+ HDP also features an advanced gas delivery unit, offering precise gas flow control, with the ability to set different temperatures for each gas to ensure repeatability and consistency. The machine also features multiple safety features, including thermal sensors and overpressure relief, ensuring safety in the event of a gas release. Centura Ultima HDP provides leading edge deposition capabilities, enabling engineers to produce high quality components with the consistency and repeatability needed for today's semiconductor devices.