Used AMAT / APPLIED MATERIALS Centura Ultima TE #116326 for sale
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ID: 116326
Wafer Size: 8"
Vintage: 1998
CVD-HDP system, 8"
Wafer shape: SNNF
SMIF: no
Chamber A: Ultima TE
Chamber B: Ultima STD
Chamber E: MS cool
Chamber F: orienter
Load lock type: wide body
Chamber A:
Nozzle: Side 24 ALN
Top baffle: 4 hole ALN
Turbo pump: STP-XH 2603P
Dual independent He Control: Standard 10/10 Torr
Clean method: Top Mount RPS AE
ESC: without WTM
Chamber B:
Nozzle: Side 24 ALN
Top baffle: 1 hole ALN
Turbo pump: ET1600WS
Dual independent He Control: Standard 10/10 Torr
Clean method: microwave
ESC: without WTM
Electrical:
Line frequency: 50/60Hz
Line voltage: 200/208V
Line amperage: 320A
Facility UPS interface: yes
GFCI: 100MA
System monitor:
1st: TTW
2nd: stand alone
3rd: yes
Mainframe:
System placement: TTW
Robot type: extended HP robot
Robot blade: ceramic
Load lock wafer mapping: enhanced
Load lock slippage sensor: yes
N2 purge type: STEC 4400M
Generator rack:
ETO 80-S09-uW
ENI AM200
Ch. A: Top / side / bias
Ch. B: Top / side / bias
(2) Heat exchangers:
1: SMC
2: AMAT 1
Umbilicals: 55ft
Dry pumps:
Chamber A: under cleaning
Chamber B: under cleaning
Load lock
Transfer
Gas delivery option:
VALVES: FUJIKIN 5 Ra max.
Filters: Pall
Transducers: MKS with display
Regulators: VeriFlo
Single line drop (SLD): yes
SLD gas lines feed: top
System cabinet exhaust: top
Gas pane configuration:
Chamber A:
O2 500sccm UNIT 8161
AR 300sccm HORIBAR
SiH4 200sccm STEC 7400
H2 1slm STEC 7400
HE 400sccm STEC 7400
SiH4 50sccm STEC 7400
H2 1slm STEC 7400
HE 400sccm STEC 7400
AR 1slm STEC 7400
NF3 2lm UNIT 8161
Chamber 4:
O2 400sccm STEC 7440
AR 300sccm STEC 7440
SiH4 200sccm HORIBAR
50%PH3/SiH4 200sccm STEC 7440
AR 50sccm STEC 7440
SiH4 20sccm STEC 7440
50%PH3/SiH4 20sccm STEC 7440
NF3 2slm HORIBAR
AR 2slm STEC 7440
O2 not shown
1998 vintage.
AMAT / APPLIED MATERIALS Centura Ultima TE (Tri-Energy) is a semiconductor processing reactor designed for the deposition of semiconductor materials. The reactor features a unique Tri-Energy (TE) equipment that provides high throughput while maintaining a high level of process uniformity. The three-stage heating system provides greater accuracy and repeatability than ever before, allowing for the highest levels of yield and reliability. AMAT Centura Ultima TE is capable of ultra-high-temperature deposition. It uses a radio frequency (RF) unit to heat the wafer with a precisely tailored combination of inductive, convective, and radiant heating. This enables the reactor to handle volatile and reactive materials used in high-temperature processes, and to obtain deposition layers that possess superior electrical and thermal characteristics. In addition, the reactor also features a unique dual-mode inert lining which protects the components from deposition by-products and residue. APPLIED MATERIALS Centura Ultima TE also comes with built-in hardware and software that make the process even easier and more precise. The TE machine utilizes an onboard intuitive touchscreen controller that allows the user to quickly and accurately perform the various deposition steps. Moreover, the TE tool is capable of interfacing with other instruments and systems, providing the user with precise control over the entire process. The reactor comes with a variety of options that make it a versatile and powerful tool in the lab or on the production floor. It can be configured to handle a range of layer growth and deposition speeds, from ultra-fast to slow and steady. Furthermore, its wide-range temperature control and high-quality coatings support a variety of material systems and processes, such as Hydrogen Terminated Diamond (HTD), Solution Growth Templates (SGT), and Atomic Layer Deposition (ALD). Centura Ultima TE is an advanced reactor that offers superior performance and excellent results for those in the semiconductor industry. Its advanced heating asset ensures high process uniformity and yields. Its interface with other systems allows for precise control over the entire process. Its various material deposition options gives it the versatility and power to handle a wide range of deposition applications. Furthermore, its intuitive touchscreen controller and dual-mode inert lining make it a reliable and safe tool. All of these features combine to make AMAT / APPLIED MATERIALS Centura Ultima TE the top choice in semiconductor processing reactors.
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