Used AMAT / APPLIED MATERIALS Centura Ultima TE #116326 for sale

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ID: 116326
Wafer Size: 8"
Vintage: 1998
CVD-HDP system, 8" Wafer shape: SNNF SMIF: no Chamber A: Ultima TE Chamber B: Ultima STD Chamber E: MS cool Chamber F: orienter Load lock type: wide body Chamber A: Nozzle: Side 24 ALN Top baffle: 4 hole ALN Turbo pump: STP-XH 2603P Dual independent He Control: Standard 10/10 Torr Clean method: Top Mount RPS AE ESC: without WTM Chamber B: Nozzle: Side 24 ALN Top baffle: 1 hole ALN Turbo pump: ET1600WS Dual independent He Control: Standard 10/10 Torr Clean method: microwave ESC: without WTM Electrical: Line frequency: 50/60Hz Line voltage: 200/208V Line amperage: 320A Facility UPS interface: yes GFCI: 100MA System monitor: 1st: TTW 2nd: stand alone 3rd: yes Mainframe: System placement: TTW Robot type: extended HP robot Robot blade: ceramic Load lock wafer mapping: enhanced Load lock slippage sensor: yes N2 purge type: STEC 4400M Generator rack: ETO 80-S09-uW ENI AM200 Ch. A: Top / side / bias Ch. B: Top / side / bias (2) Heat exchangers: 1: SMC 2: AMAT 1 Umbilicals: 55ft Dry pumps: Chamber A: under cleaning Chamber B: under cleaning Load lock Transfer Gas delivery option: VALVES: FUJIKIN 5 Ra max. Filters: Pall Transducers: MKS with display Regulators: VeriFlo Single line drop (SLD): yes SLD gas lines feed: top System cabinet exhaust: top Gas pane configuration: Chamber A: O2 500sccm UNIT 8161 AR 300sccm HORIBAR SiH4 200sccm STEC 7400 H2 1slm STEC 7400 HE 400sccm STEC 7400 SiH4 50sccm STEC 7400 H2 1slm STEC 7400 HE 400sccm STEC 7400 AR 1slm STEC 7400 NF3 2lm UNIT 8161 Chamber 4: O2 400sccm STEC 7440 AR 300sccm STEC 7440 SiH4 200sccm HORIBAR 50%PH3/SiH4 200sccm STEC 7440 AR 50sccm STEC 7440 SiH4 20sccm STEC 7440 50%PH3/SiH4 20sccm STEC 7440 NF3 2slm HORIBAR AR 2slm STEC 7440 O2 not shown 1998 vintage.
AMAT / APPLIED MATERIALS Centura Ultima TE (Tri-Energy) is a semiconductor processing reactor designed for the deposition of semiconductor materials. The reactor features a unique Tri-Energy (TE) equipment that provides high throughput while maintaining a high level of process uniformity. The three-stage heating system provides greater accuracy and repeatability than ever before, allowing for the highest levels of yield and reliability. AMAT Centura Ultima TE is capable of ultra-high-temperature deposition. It uses a radio frequency (RF) unit to heat the wafer with a precisely tailored combination of inductive, convective, and radiant heating. This enables the reactor to handle volatile and reactive materials used in high-temperature processes, and to obtain deposition layers that possess superior electrical and thermal characteristics. In addition, the reactor also features a unique dual-mode inert lining which protects the components from deposition by-products and residue. APPLIED MATERIALS Centura Ultima TE also comes with built-in hardware and software that make the process even easier and more precise. The TE machine utilizes an onboard intuitive touchscreen controller that allows the user to quickly and accurately perform the various deposition steps. Moreover, the TE tool is capable of interfacing with other instruments and systems, providing the user with precise control over the entire process. The reactor comes with a variety of options that make it a versatile and powerful tool in the lab or on the production floor. It can be configured to handle a range of layer growth and deposition speeds, from ultra-fast to slow and steady. Furthermore, its wide-range temperature control and high-quality coatings support a variety of material systems and processes, such as Hydrogen Terminated Diamond (HTD), Solution Growth Templates (SGT), and Atomic Layer Deposition (ALD). Centura Ultima TE is an advanced reactor that offers superior performance and excellent results for those in the semiconductor industry. Its advanced heating asset ensures high process uniformity and yields. Its interface with other systems allows for precise control over the entire process. Its various material deposition options gives it the versatility and power to handle a wide range of deposition applications. Furthermore, its intuitive touchscreen controller and dual-mode inert lining make it a reliable and safe tool. All of these features combine to make AMAT / APPLIED MATERIALS Centura Ultima TE the top choice in semiconductor processing reactors.
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