Used AMAT / APPLIED MATERIALS Centura Ultima X #116359 for sale

AMAT / APPLIED MATERIALS Centura Ultima X reactor is a specialized tool designed for high-performance material deposition and processing. This reactor is designed for use in a wide range of semiconductor manufacturing applications, including field effect transistor (FET) fabrication and deposition of thin films. In comparison to conventional deposition systems, the Ultima X provides a number of advantages, including higher throughputs and smaller feature sizes. The Ultima X reactor is a vertical, untethered tool, meaning the entire chamber is mounted on a single base plate in order to minimize contamination. It features two independent etch/deposition process chambers, including a high-power plasma-enhanced chemical vapor deposition (PECVD) chamber and a low-resistance physical vapor deposition (PVD) chamber, providing the ability to individually control process conditions in each chamber. For instance, the PECVD chamber offers a range of maximum temperatures from 350 to 600 degrees Celsius and a process gas pressure range of 16 to 300 Torr. The PVD chamber has temperatures up to 400 degrees Celsius and a process gas pressure of 1 to 10 Torr. The Ultima X also has a load lock equipment, which enables the processing of substrates (typically silicon wafers) without being exposed to ambient air. This ensures that the substrates have minimal contamination prior to entering the process chamber. Additionally, the Ultima X supports advanced lithography techniques, such as double-exposure lithography, and wafer orientation sensing, which is used to enable step-and-repeat process patterns. As well as offering excellent performance, the Ultima X system offers a range of safety features, such as an automated emergency shut-down unit in the event of process errors and a pressure-monitoring machine that prevents the tool from operating outside of specific process parameters. There is also an integrated passivation asset for the surfaces of the main chamber, which helps to reduce the chances of particle or residue. In conclusion, AMAT Centura Ultima X reactor is an advanced tool designed for high-performance semiconductor manufacturing. Thanks to its advanced etch and deposition processes, it offers higher throughputs and smaller feature sizes than many other systems. It also features several safety features, ensuring that it operates in a safe and controlled manner.