Used AMAT / APPLIED MATERIALS Centura Ultima X #9195501 for sale

AMAT/AMAT / APPLIED MATERIALS Centura Ultima X reactor is an advanced tin and silicide CVD (Chemical Vapor Deposition) system designed for the implementation of advanced materials and structures for semiconductor device manufacturing processes. The Ultima X increases accuracy, CVD functionality, and process flexibility to ensure a robust and dependable manufacturing process. The Ultima X features a dual-port architecture for the introduction of dual source/chamber materials. This allows for faster process times as two substrates can be simultaneously processed. In addition, a dual laser-etched showerhead provides better distribution of reactant gases over the substrates without any disruption to the processes. The Ultima X's precision temperature control and high-sensitivity pressure transducers ensure superior process accuracy and repeatability. This increases yield and consistency, as the control of both pressure and temperature are essential to obtaining optimal results during the CVD process. The Ultima X's advanced software suite provides comprehensive control over all aspects of the process, including gas recipes, chamber operations, and autocalibration. This allows users to analyze recipes in real-time, monitor critical process parameters, and adjust process parameters in real-time to optimize process conditions. The Ultima X's automated capability allows for an extremely low-maintenance operation. The maintenance operations are limited to routine cleaning of dispense tubes, capillaries, gas manifold, and optical ports. The system can be fully automated, meaning that it can run unattended for hours to days at a time, allowing for greater efficiency. In order to ensure process stability, the Ultima X provides an adjustable bypass feature that reduces pressure and temperature variations in the process chamber. The bypass also helps to prevent power fluctuations, resulting in improved accuracy and repeatability. All components used in the Ultima X are high-quality and designed for long-term performance. The high-grade quartz process chamber, formed for maximum uniformity and evaporation debris control, provides superior performance. In addition, the power supplies and instruments are designed to eliminate interference, reduce power noise, and improve product quality. APPLIED MATERIALS/AMAT Centura Ultima X is a reliable and advanced CVD tool for the implementation of advanced materials and structures for the semiconductor industry. It offers superior accuracy, CVD functionality, and process flexibility, while also providing an automated and low-maintenance operation.