Used AMAT / APPLIED MATERIALS Centura Ultima X #9200053 for sale

AMAT / APPLIED MATERIALS Centura Ultima X is a high-performance, flexible, and cost-effective etch reactor designed for a wide variety of semiconductor manufacturing processes. The reactor provides the advantage of low etch temperatures and a high etch rate, as well as high-temperature stability and repeatability. The Ultima X has been designed to meet the needs of high-volume production, with its environmentally friendly design and advanced equipment components. The Ultima X features a three-zone heated chamber, with a heated lid, that is designed for uniformity of both process temperature and bubble point. The reactive gas handling system ensures precise, accurate delivery of critical gas components, whilst the advanced remote diagnostics module allows for remote monitoring. Also, the Ultima X features Precise Despense metering technology which enables precise gas flow control, allowing for minimised etch processes. The Ultima X utilises a range of etch strategies, including Etch Release, which provides increased selectivity and better process control. The modular design of the reactor allows for easy maintenance and reconfiguration, allowing for more flexibility over traditional etch tools. In addition, the reactor is designed for extremely low downtime and maintenance, with its integrated safety features and process validation tools. In addition, the Ultima X offers a range of benefits, such as reduced downtime, improved throughput, and improved batch process control. The integrated monitoring unit provides enhanced process control and real-time diagnostics, whilst the assisted software module ensures accuracy, consistency and repeatability. The reactor also utilises AMAT proprietary Process IQ software, which enables batch and advanced process control. In conclusion, AMAT Centura Ultima X is an advanced etch reactor that has been designed for high-volume production. The reactor offers a range of benefits, including low etch temperatures, high etch rates, high temperature stability, and precise gas flow control. Additionally, it features an integrated monitoring machine, assisted software module, and Process IQ software.