Used AMAT / APPLIED MATERIALS Centura Ultima X #9220219 for sale

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AMAT / APPLIED MATERIALS Centura Ultima X
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ID: 9220219
CVD System, 12" Mainframe: Centura ACP (2) PSG Chambers Components: (2) RF Generator racks AC Rack (2) SMC HX FI Missing parts: (2) ESC, P/N: 0040-48594 (2) BIAS Matches, P/N: 1110-00056 (2) RPS, P/N: 0190-24886 (2) Turbo pumps, P/N: 3620-00376 (2) Turbo controllers, P/N: 3620-00377 (2) Domes, P/N: 0200-01347 (2) WTM Probes, P/N: 1150-01028 (2) Throttle valves, P/N: 0010-29980 FE Server, P/N: 0090-04434 FI Server, P/N: 0090-04332 RT server, P/N: 0090-04468 Buffer robot driver, P/N: 0090-01972 UPS, P/N: 0190-22273 Currently warehoused 2007 vintage.
AMAT / APPLIED MATERIALS Centura Ultima X Reactor is a state-of-the-art processing equipment designed for high-volume deposition and etching applications in the semiconductor industry. It features a large-area thermal process chamber integrated in a compact system that offers greater throughput and improved cost efficiency. This Industy-leading, integrated, reactor unit delivers the highest uniformity, throughput, and yield in advanced process technologies. AMAT Centura Ultima X Reactor machine features a large-area thermal process chamber measuring 15-x-15x-2 inches. This process chamber is designed to process large wafer substrates allowing higher throughput as compared to traditional reactors. It is tuned for optimum performance at both harsh and low temperature deposit and etch processes. The chamber is equipped with a fast sample load/unload port which allows for quick sample turnaround while keeping the wafers in a safe and controlled environment. The tool also features a wide array of technologies including an independent chamber temperature control with a precision of 0.1°C, a high-speed frequency switching design, and a capacitive pressure control valve. Additionally, the process chamber can be configured with up to eight gas inputs, providing the flexibility to meet a variety of process requirements. APPLIED MATERIALS Centura Ultima X Reactor is designed to provide high quality deposition and etch processing with excellent uniformity and throughput. Its advanced Multi-Etch technology allows for significantly improved deposition and etching uniformity while reducing thermal budgeting. The processing asset is well-suited for advanced semiconductor processes that demand high throughput production. It is also configured with a host of safety features like overpressure, sample rotation, and bottom isolation to help reduce risk of contamination. In addition to the reactor's advanced performance capabilities, it also comes with a convenient automation package. This package includes a flexible, user-friendly intuitive graphical user interface (GUI) and process recipe extensive diagnostics that can be tailored to the user's specific needs. Centura Ultima X also offers a wide selection of diagnostics and metrology tools. AMAT / APPLIED MATERIALS Centura Ultima X Reactor is a powerful and dependable model well suited for process needs in the advanced semiconductor market. Its compact design, advanced technologies, and ease of use make it a popular choice for many industries. With its innovative thermal design, resilient performance, and cost-efficient production, AMAT Centura Ultima X Reactor is the ultimate solution for high-quality process uniformity and throughput.
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