Used AMAT / APPLIED MATERIALS Centura Ultima X #9229987 for sale

AMAT / APPLIED MATERIALS Centura Ultima X
ID: 9229987
Wafer Size: 12
Vintage: 2007
CVD System, 12" 2007 vintage.
AMAT / APPLIED MATERIALS Centura Ultima X reactor is a specialized tool for chemical vapor deposition (CVD) processes and other advanced chemical processes in the semiconductor industry. With proprietary features such as Pro-Liner™ technology, powered by advanced software algorithms, AMAT Centura Ultima X enables repeatable and uniform deposition. Maximum deposition efficiency is achieved through the Pro-Liner™ feature, which ensures accurate trajectories and uniform pressure profiles throughout the chamber. The Ultima X also utilizes a uniquely designed sub-atmospheric pressure differential between the process source and the chamber, which increases process efficiency and uniformity. The intuitive 7-inch front display and graphical user interface provides real-time feedback of process parameters and chamber pressures, while the multi-tasking capability allows users to run multiple processes simultaneously. APPLIED MATERIALS Centura Ultima X offers four independent thermal zones, allowing users to perform chamber conditioning, component/tool validations, chemical amplifiers, and multiple processing. The thermal range of all four zones is wider than normal, allowing for more accuracy and repeatability when processing wafers with varying temperatures and process chemistries. The Ultima X is equipped with a precise temperature control equipment, capable of accurately controlling temperatures within a 0.5°C range. Additionally, the reactor offers highly precise flow control, which helps ensure accurate dosages of process chemistries. Centura Ultima X offers superior specifications, such as a process chamber diameter of 64.5 inches, a process chamber depth of 23.3 inches, a maximum process temperature of 800°C, and a maximum process pressure of 10 Torr. The power system is composed of two 6kW magnets, which allow for fast heating and cooling of the process chamber. Additionally, the reactor offers a maximum gas flow rate of 12000 litres/minute, and a maximum BTU/hr of 2.475. The Ultima X is designed for maximum safety, featuring a clean chamber cycle mode which monitors process conditions and automatically purges any residual process/chemistry from the chamber, as well as an alarm unit that monitors pressure, temperatures, and gas flow. The reactor includes a variety of built-in safety features, as well as an automatic interlock machine which prevents users from entering the chamber during hazardous process procedures. AMAT / APPLIED MATERIALS Centura Ultima X is ideal for CVD and other advanced chemical processes, offering superior process efficiency, repeatability, and uniformity. Its intuitive graphical user interface makes it user-friendly, while its advanced features offer maximum safety and precision. With an efficient thermal range and precise flow/temperature controls, AMAT Centura Ultima X can deliver outstanding process results.
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