Used AMAT / APPLIED MATERIALS Centura Ultima X #9401460 for sale

AMAT / APPLIED MATERIALS Centura Ultima X
ID: 9401460
Vintage: 2005
CVD System 2005 vintage.
AMAT / APPLIED MATERIALS Centura Ultima X is a next-generation reactor designed to create optically-pure silicon materials used in semiconductor and other high-tech processes. The reactor is engineered to deliver results through a combination of advanced technologies, optimised materials and proven expert engineering. The reactor is equipped with advanced plasma-based processing capabilities tailored to optimally deposit optical-grade silicon films. This process is fully automated and produces extremely uniform and planar surfaces, greatly simplifying subsequent post-processing on the created films. The reactor also has a flexible workflow with recipes for a variety of different materials, allowing for rapid prototyping and up to 50 simultaneous film deposition applications. The Ultima X reactor is able to benefit from the latest innovations in thermal management, ensuring uniform temperatures and uniform thermal expansion of depositing films. This ensures excellent crystallinity and avoids problems such as internal stress and cracking, allowing for rapid processing and high quality films. The reactor additionally benefits from advanced mechanical components, such as a double column for minimal operational drift, and state-of-the-art friction-force control mechanisms that enable precise and reproducible recipes. The reactor is specifically designed for applications in the semiconductor industry and the associated fabrication of high-performance microprocessors. Therefore, it features a novel airlock system that enables efficient material exchange with minimal risk of contamination or process interruption. Additionally, the reactor is supplied with an industrial-grade safety system, creating a safe and accurate processing environment. Finally, AMAT Centura Ultima X is supported by an extensive library of best-in-class recipes and an adjustable process control engine that enables real-time tuning and adjustment of the deposition process. By helping to ensure the highest possible quality of the created films and finished products, this reactor is the perfect choice for the most demanding fabrication processes in the semiconductor industry.
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