Used AMAT / APPLIED MATERIALS Centura Ultima #9087848 for sale

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ID: 9087848
Wafer Size: 8"
Vintage: 2009
HDPCVD System, 8" Wafer shape: SNNF SMIF Interface: No Narrow loadlock (3) Ultima STD chambers Chamber information Chamber A: Ebara ET1600W turbo pump Chamber B: Ebara ET1600W turbo pump Chamber C: Ebara ET1600W turbo pump System monitor: First monitor: Through the wall Second monitor: Stand alone Mainframe information: System placement: Stand alone Robot type: HP Robot Robot blade: Ceramic Loadlock wafer mapping: Enhanced N2 Purge type: STEC 4400MC Gas delivery options: MFC type: STEC 4400MC Valves: Veriflow 10 Ra Max Filters: Mott Transducers: MKS w/o display Regulators: Veriflo Single line drop Top SLD gas line feed Gas panel door: Safety wired glass Top system cabinet exhaust MFC: Chamber A: Gas #1: O2 400 sccm Gas #2: AR 300 sccm Gas #3: SIH4 200 sccm Gas #4: SIH4 100 sccm Gas #5: AR 50 sccm Gas #6: SIH4 30 sccm Gas #7: SIH4 10 sccm Gas #8: NF3 2 slm Gas #9: AR 2 slm Chamber B: Gas #1: O2 400 sccm Gas #2: AR 300 sccm Gas #3: SIH4 200 sccm Gas #4: SIH4 100 sccm Gas #5: AR 50 sccm Gas #6: SIH4 30 sccm Gas #7: SIH4 10 sccm Gas #8: NF3 2 slm Gas #9: AR 2 slm Chamber C: Gas #1: O2 400 sccm Gas #2: AR 300 sccm Gas #3: SIH4 200 sccm Gas #4: SIH4 100 sccm Gas #5: AR 50 sccm Gas #6: SIH4 30 sccm Gas #7: SIH4 10 sccm Gas #8: NF3 2 slm Gas #9: AR 2 slm 50/60Hz, 208V, 320A, 100MA 2009 vintage.
AMAT / APPLIED MATERIALS Centura Ultima is an advanced nanoscience research reactor designed to perform complex process operations with an ultra-high throughput and ultra-long life performance. This system features a high-precision, high-throughput multi-chamber reactor for precise and accurate deposition of materials with high process throughput, helping to deliver repeatable, low-cost results. This reactor uses a gasmix with adjustable gas flow rate and pressure controls, with a 1000 mbar operating pressure range and 0.0005 resolution for fine processing control. It also features robust, hermetically-sealed chambers designed to minimize contamination risk, allowing for quick and easy cleaning. The chamber design optimizes uniformity of deposition for both thin-film and layered processes, while minimizing the noise and vibration that can affect an otherwise tightly-controlled environment. This reactor is equipped with in situ diagnostics and control systems, including a high resolution camera and microwave gas analyser, enabling automatic precise control and monitoring of the deposition process. The capability to diagnose a process quickly and accurately allows the user to remedy any issues quickly and accurately. The chamber is also mechanically tunable, allowing for the adjustment of different parameters and optimization of the process. AMAT Centura Ultima is designed for compatibility with a wide range of nanomaterials and substrate materials - offering the benefit of flexible deposition. This system has a Class 3 cleanroom environment ensuring a low particle environment and optimum temperature stability. It also comes with an innovative AMAT-supported programme of customer application, research collaborations and training in nanomaterials. All components, such as target holders and deposition sources, are coordinated and interchangeable according to the user requirements, ensuring that any nanomaterial-specific processing needs can be met. This versatile reactor has been proven to be a reliable and powerful platform for a wide range of research and development needs, providing an ultimate level of performance. With a versatile design and reliable, repeatable results, APPLIED MATERIALS Centura Ultima is a valuable tool for advanced nanoscience research.
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