Used AMAT / APPLIED MATERIALS Centura Ultima #9087848 for sale
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ID: 9087848
Wafer Size: 8"
Vintage: 2009
HDPCVD System, 8"
Wafer shape: SNNF
SMIF Interface: No
Narrow loadlock
(3) Ultima STD chambers
Chamber information
Chamber A:
Ebara ET1600W turbo pump
Chamber B:
Ebara ET1600W turbo pump
Chamber C:
Ebara ET1600W turbo pump
System monitor:
First monitor: Through the wall
Second monitor: Stand alone
Mainframe information:
System placement: Stand alone
Robot type: HP Robot
Robot blade: Ceramic
Loadlock wafer mapping: Enhanced
N2 Purge type: STEC 4400MC
Gas delivery options:
MFC type: STEC 4400MC
Valves: Veriflow 10 Ra Max
Filters: Mott
Transducers: MKS w/o display
Regulators: Veriflo
Single line drop
Top SLD gas line feed
Gas panel door: Safety wired glass
Top system cabinet exhaust
MFC:
Chamber A:
Gas #1: O2 400 sccm
Gas #2: AR 300 sccm
Gas #3: SIH4 200 sccm
Gas #4: SIH4 100 sccm
Gas #5: AR 50 sccm
Gas #6: SIH4 30 sccm
Gas #7: SIH4 10 sccm
Gas #8: NF3 2 slm
Gas #9: AR 2 slm
Chamber B:
Gas #1: O2 400 sccm
Gas #2: AR 300 sccm
Gas #3: SIH4 200 sccm
Gas #4: SIH4 100 sccm
Gas #5: AR 50 sccm
Gas #6: SIH4 30 sccm
Gas #7: SIH4 10 sccm
Gas #8: NF3 2 slm
Gas #9: AR 2 slm
Chamber C:
Gas #1: O2 400 sccm
Gas #2: AR 300 sccm
Gas #3: SIH4 200 sccm
Gas #4: SIH4 100 sccm
Gas #5: AR 50 sccm
Gas #6: SIH4 30 sccm
Gas #7: SIH4 10 sccm
Gas #8: NF3 2 slm
Gas #9: AR 2 slm
50/60Hz, 208V, 320A, 100MA
2009 vintage.
AMAT / APPLIED MATERIALS Centura Ultima is an advanced nanoscience research reactor designed to perform complex process operations with an ultra-high throughput and ultra-long life performance. This system features a high-precision, high-throughput multi-chamber reactor for precise and accurate deposition of materials with high process throughput, helping to deliver repeatable, low-cost results. This reactor uses a gasmix with adjustable gas flow rate and pressure controls, with a 1000 mbar operating pressure range and 0.0005 resolution for fine processing control. It also features robust, hermetically-sealed chambers designed to minimize contamination risk, allowing for quick and easy cleaning. The chamber design optimizes uniformity of deposition for both thin-film and layered processes, while minimizing the noise and vibration that can affect an otherwise tightly-controlled environment. This reactor is equipped with in situ diagnostics and control systems, including a high resolution camera and microwave gas analyser, enabling automatic precise control and monitoring of the deposition process. The capability to diagnose a process quickly and accurately allows the user to remedy any issues quickly and accurately. The chamber is also mechanically tunable, allowing for the adjustment of different parameters and optimization of the process. AMAT Centura Ultima is designed for compatibility with a wide range of nanomaterials and substrate materials - offering the benefit of flexible deposition. This system has a Class 3 cleanroom environment ensuring a low particle environment and optimum temperature stability. It also comes with an innovative AMAT-supported programme of customer application, research collaborations and training in nanomaterials. All components, such as target holders and deposition sources, are coordinated and interchangeable according to the user requirements, ensuring that any nanomaterial-specific processing needs can be met. This versatile reactor has been proven to be a reliable and powerful platform for a wide range of research and development needs, providing an ultimate level of performance. With a versatile design and reliable, repeatable results, APPLIED MATERIALS Centura Ultima is a valuable tool for advanced nanoscience research.
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