Used AMAT / APPLIED MATERIALS Centura Ultima #9137477 for sale

AMAT / APPLIED MATERIALS Centura Ultima is an advanced plasma etch/clean chamber equipment that streamlines fabrication processes. This system comprises of a high vacuum chamber, a radio frequency (RF) generator and a plasma source, amongst other components. The Plasma Source is a Balor Torch mounted in the top chamber. It consists of a Balor/Balor Ultra double-ended, dual annular ring design, with an array of up to 16 chemistry delivery ports for nozzle cooling. The chamber has a plasma assembly to direct the operation of the Balor Torch and contains the plasma-generating transformer and the hydrogen-argon chemistry delivery unit. The RF generator provides the energy to activate the plasma source. The RF power supplies can be of various configurations, and the chamber also has a sextupole magnetic field generator that reduces plasma pressure, increases RF power utilization, and improves etch uniformity. The chamber is outfitted with a comprehensive range of components to ensure uniform etch pattern. To keep the interior clean and free of contaminants, an exhaust fan and filter machine circulates high velocity clean air and removes residual and generated particles. AMAT Centura Ultima is equipped with an MRP II Gas Technology Tool, with up to five gas lines to deliver and control the gas flows inside the chamber. This feature enables users to achieve more consistent etch rates across different substrates. The chamber also has an optional helium (He) backside cooling package that facilitates the control of temperatures to prevent dielectric choke damage and subsequent over-etching. The front loading robot offers an easy and safe way to transfer substrates through the chamber, and the chamber is designed to provide easy access to all components for maintenance and replacement purposes. The chamber is enclosed in a robust cabinet, strongly constructed to withstand harsh production environment and ensure safety of personnel. APPLIED MATERIALS Centura Ultima is a highly capable etch/clean tool. It is a reliable and versatile asset that is capable of providing extremely uniform etch profiles and reproducible results. Its efficient gas delivery model and high-performance RF generator enable users to achieve high precision etching and cleaning, while its advanced components and customizable design allow users to tailor it to their specific needs and processes.