Used AMAT / APPLIED MATERIALS Centura Ultima #9157680 for sale

AMAT / APPLIED MATERIALS Centura Ultima is a full-featured multi-chamber chemical vapor deposition (CVD) reactor designed for the deposition of metals and dielectrics. It is capable of depositing a wide variety of materials including aluminum, silicon, titanium, tungsten and copper. The equipment is equipped with an automated pressure control system, an advanced monitoring unit, and an intuitive user interface for ease of use. The Ultima also includes a patented ultra-precise voltage-controlled impedance matching (VCIM) machine to ensure optimal and repeatable deposition processes. The reactor's multi-chamber design and modular platform provide unequalled flexibility, enabling the user to apply different process and parameters to each chamber in order to tailor surface hydrophilicity, adhesion, and barrier properties for specific applications. The integrated temperature controller and multiple sources for gas flow allow the user to precisely control the deposition rate, thermal distribution and uniformity. Further, the Ultima offers low electrical contact resistance, enhanced particle filtration, and state-of-the-art safety features. The Ultima features a custom-designed heating element to ensure a uniform heat transfer and a minimized thermal gradient. The heat element also provides an improved temperature range of up to 950ºC, allowing the user a greater flexibility with their deposition processes. With the advanced monitoring and automated pressure control, the user can ensure consistent parameters and reproducible results. A great benefit of the Ultima is its minimization of noise, thanks to its patented VCIM. This tool also aids in reduction of maintenance, creating a safer and more reliable deposition environment. The Ultima also simplifies wafer loading and unloading, with its automated cassette-to-cassette motion and its tool-less access door. This ensures a quick and easy transition between chamber loading and unloading, saving time and reducing errors. In addition, its pneumatically actuated isolation valve allows for isolation of unused parts of the reactor, further streamlining chamber loading and unloading. Overall, AMAT Centura Ultima is an ideal deposition asset for materials such as aluminum, silicon, titanium, tungsten and copper. With features such as an advanced monitoring model, automated pressure control, intuitive user interface and patented VCIM equipment, the user can enjoy improved deposition processes and equipments reliability. The Ultima also provides an improved thermal range of up to 950ºC and low electrical contact resistance, along with enhanced particle filtration and safe loading and unloading for maximum user flexibility and protection.