Used AMAT / APPLIED MATERIALS Centura Ultima #9189699 for sale

AMAT / APPLIED MATERIALS Centura Ultima is a reactor designed for the deposition of thin films by physical vapor deposition (PVD). AMAT Centura Ultima is the latest in a line of PVD systems developed by AMAT and features advanced technology to ensure the highest quality thin films are created. The equipment is composed of three main components: the PVD Source, the Chamber, and the Substrate Manipulator. The PVD Source is a vacuum chamber that houses the material to be deposited. A gas is injected into the chamber at a low pressure and the material is heated up to several hundred degrees Celsius to effectuate the evaporation of the materials onto the substrate. The Chamber is the main body of APPLIED MATERIALS Centura Ultima, providing the shield to protect the source from the rest of the system. The chamber is typically atmospheric pressure and is home to the Substrate Manipulator. The Substrate Manipulator is the piece of the unit that interacts directly with the substrate and depositing material. It is the responsibility of the Substrate Manipulator to move the substrate and the depositing material relative to each other for deposition. Centura Ultima is built to provide the most advanced and efficient methods for thin film deposition. Careful design and implementation of the various components of the machine allow for thin films to be deposited in a uniform layer as thin as 10 nm. The source is optimized to provide a high deposition rate ensuring the highest throughput available and ensuring cost-effective operations. Additional features of AMAT / APPLIED MATERIALS Centura Ultima that contribute to cost-effectiveness and user convenience are automatic adjustment for wafer size and a flexible recipe tool for simple optimization of the process. Finally, AMAT Centura Ultima is designed to be both reliable and easy to maintain. By providing a highly accessible chamber design and multiple view ports, maintenance can be performed quickly and safely. The Shield Susceptor Generator can also be easily exchanged by users to ensure optimal performance and limit downtime. APPLIED MATERIALS Centura Ultima is the next generation of thin film deposition systems, offering industry-leading performance, reliability, and convenience. With an optimized source and the ability to deposit films as thin as 10 nm, Centura Ultima offers a complete solution for thin film deposition needs.