Used AMAT / APPLIED MATERIALS Centura WCVD #9116739 for sale

AMAT / APPLIED MATERIALS Centura WCVD (Chemical Vapor Deposition) reactor is a versatile semiconductor device fabrication tool that enables advanced 3D functionality. It is used for depositing a variety of thin film materials including polysilicon, Si3N4, SiO2, and other doped and non-doped dielectrics. The tool operates by delivering a gas mixture of two or more source materials into a chamber using a carrier gas, then heating them to a predetermined temperature and pressure to create a chemical reaction. This reaction produces a reaction product, which is then deposited in a thin layer on a substrate such as a silicon wafer. AMAT Centura WCVD reactor is equipped with a number of different technologies and configurations to allow the user to adjust the process to their desired requirements. This includes adjustable reactant concentration, adjustable substrate temperature, adjustable heater power, adjustable pressures, adjustable residence times, and adjustable chamber geometry. These features allow the reactants to be precisely controlled, ensuring consistent and repeatable deposition performance. Additionally, APPLIED MATERIALS CENTURA WCVD reactor comes with a comprehensive temperature control and diagnostics package, which includes temperature monitoring of both the substrate and the the deposition chamber. This further assists the operator by providing real-time feedback on the condition of the tool and its processes. The chemical vapor deposition technique used by APPLIED MATERIALS Centura WCVD reactor is highly reliable and repeatable. It is capable of producing extremely uniform and smooth surfaces, ideal for advanced applications such as copper interconnects, through-silicon vias, MEMS/NEMS, radio frequency and analog ICs, optical devices, and MEMS/3D transistors. In addition, Centura WCVD reactor offers high thermal efficiency and low gas usage, making it both cost effective and eco-friendly. Overall, CENTURA WCVD reactor provides advanced and reliable chemical vapor deposition solutions. It is capable of producing extremely uniform and low defect surfaces, ideal for the fabrication of advanced semiconductor devices. The tool's adjustable configuration options, comprehensive temperature control and diagnostics package, and high thermal efficiency enable the operator to produce cost effective, repeatable, and reliable products.