Used AMAT / APPLIED MATERIALS Centura WCVD #9116741 for sale

AMAT / APPLIED MATERIALS Centura WCVD (CVD) Deposition Reactor has revolutionized the semiconductor industry. This reactor is designed for the deposition of metal and dielectric materials on the substrate in a wide variety of processes. This is done by generating a high temperature reaction environment to deposit high-quality films and compounds onto the surface. The major advantage of using AMAT Centura WCVD Reactor is the capability to increase deposition rate, improve temperature uniformity and consistency of the films and reduce particle contamination. APPLIED MATERIALS CENTURA WCVD is equipped with four high-frequency quartz-halogen lamps to achieve optimum deposition rates while still maintaining uniform temperature distribution, minimum cross contamination and low particle emission. It also features a high-flow premixed gas injector to achieve improved uniformity in deposition rates. This method of gas delivery is more reliable and prevents the generation of hot spots on the sample. Additionally, the system includes a thermally-stable chamber for stable substrate temperature profile, reduced thermal overload and improved accuracy of process results. AMAT / APPLIED MATERIALS CENTURA WCVD Reactor is highly efficient in the manufacture of VLSI circuits and optical materials. It enables thin film growth of complex alloys as well as the deposition of polymers and low dielectric constant coatings. In addition, Centura WCVD Reactor can be used for CVD encapsulation, barrier layers, photo resist deposition and dielectric layer deposition. AMAT CENTURA WCVD Reactor is an ideal choice for advanced materials such as monocrystalline silicon wafers, dielectric layers, polyimide, and quartz. It features high-temperature operation up to 1400°C for the deposition of ultra-thin layers in the order of nanometers. The reactor is designed to provide utmost process uniformity control. It also features a wide range of temperatures and residence time with excellent repeatability and reproducibility. APPLIED MATERIALS Centura WCVD Reactor will provide the highest quality and productivity for all process applications in high-end microelectronics technology. Its ability to improve deposition rate and temperature uniformity, while minimizing particle contamination, makes it an ideal choice for the semiconductor industry.