Used AMAT / APPLIED MATERIALS Centura WCVD #9116742 for sale

AMAT / APPLIED MATERIALS Centura WCVD (known as AMAT or APPLIED MATERIALS and previously known as Centura) is a high-end chemical vapor deposition (CVD) reactor from AMAT / APPLIED MATERIALS Corporation. It is used for the deposition of films and coatings on a variety of substrates. The equipment has advanced functionality for the deposition of films and coatings with very precise control over the operating parameters. AMAT Centura WCVD consists of three main parts, including the material source, the substrate heater, and the reaction chamber. The source is typically a gas source, which is used to deliver the vaporized source material to the reaction chamber. The substrate heater is typically electrically powered and is used to heat the substrate to the desired temperature for the CVD reaction. Finally, the reaction chamber contains the substrates and gas source, and is where the controlled chemical reaction takes place. APPLIED MATERIALS CENTURA WCVD has a wide variety of operating parameters that can be carefully tuned for optimal results. These parameters include substrate temperature, gas flow rate, pressure, relative gas mix, and others. The system is highly automated, with automatic calibration and feedback to ensure the desired parameters are achieved. AMAT / APPLIED MATERIALS CENTURA WCVD is capable of depositing a variety of materials, including silicates, oxides, nitrides, and others. It is also highly efficient, enabling high throughput rates while operating at low temperatures. This combination of efficiency and accuracy makes AMAT CENTURA WCVD an excellent choice for applications requiring precise, controlled film deposition. Centura WCVD is a robust, reliable unit that can provide consistent results across a wide range of parameters. It has a variety of safety features and is easy to operate and maintain. The machine is designed to provide reliable and repeatable results, with high levels of accuracy for specific film deposition applications.