Used AMAT / APPLIED MATERIALS Centura WCVD #9116743 for sale

AMAT AMAT / APPLIED MATERIALS Centura WCVD reactor is a state-of-the-art chemical vapor deposition (CVD) equipment used in semiconductor manufacturing processes. This advanced CVD system is designed to deliver higher-yielding epitaxial films at higher deposition rates than traditional CVD systems. AMAT Centura WCVD reactor features a number of components that combine to bring superior results in epitaxial and diffusion applications. Firstly, APPLIED MATERIALS CENTURA WCVD reactor has an endothermic or heated gas source distribution unit. This machine utilizes proprietary technologies to deliver uniform and repeatable gas distributions to the ID and OD cylinders of the tool. The gas distribution asset also provides precise uniformity to the reactor chamber, giving repeatable results. In addition, AMAT CENTURA WCVD reactor is equipped with a high-efficiency heated transfer chamber (HTC). This chamber provides effective thermal control and ensures uniform infusion of process gases onto substrate wafers. The HTC also reduces damage caused by radiant heat energy and enables faster thermal recovery when cycling between recipe steps. Furthermore, CENTURA WCVD reactor features an innovative programmable showerhead injection model. This equipment is capable of producing process gases in a configurable shower pattern giving greater flexibility and control over the deposition process. Also, the multiple individual nozzle rings can be used to enable precise control over diffusion time and the resulting chamber environment. To complement the showerhead injection system, Centura WCVD is fitted with a quartz channel electron cyclotron resonance (ECR) source. This unit provides high power plasma for plasma-enhanced growth rates, low residual gas and better control of film parameters. It also offers an unparalleled ability to control growth parameters such as temperature and gas chemistry independently. Finally, APPLIED MATERIALS Centura WCVD reactor features a photonic curing module. This module is designed to further improve device performance through Ultraviolet (UV) exposure of the surface wafer after deposition. This ensures greater uniformity and better adaptation of the wafer for further processing. Overall, AMAT / APPLIED MATERIALS CENTURA WCVD reactor is a powerful and versatile tool for producing high-quality epitaxial and diffusion films. Its advanced features and components provide users with greater control, uniformity and repeatability for their processing needs.